| Low dielectric constant materials for ULSI interconnects M Morgen, ET Ryan, JH Zhao, C Hu, T Cho, PS Ho Annual Review of Materials Science 30 (1), 645-680, 2000 | 510 | 2000 |
| Positronium annihilation in mesoporous thin films DW Gidley, WE Frieze, TL Dull, AF Yee, ET Ryan, HM Ho Physical Review B 60 (8), R5157, 1999 | 362 | 1999 |
| Methods of forming graphene liners and/or cap layers on copper-based conductive structures ET Ryan, Z Krivokapic, X Zhang, C Witt, M He, L Zhao US Patent App. 13/684,871, 2014 | 301 | 2014 |
| Progress in the development and understanding of advanced low k and ultralow k dielectrics for very large-scale integrated interconnects—State of the art A Grill, SM Gates, TE Ryan, SV Nguyen, D Priyadarshini Applied Physics Reviews 1 (1), 2014 | 294 | 2014 |
| Properties of nanoporous silica thin films determined by high-resolution x-ray reflectivity and small-angle neutron scattering W Wu, WE Wallace, EK Lin, GW Lynn, CJ Glinka, ET Ryan, HM Ho Journal of applied physics 87 (3), 1193-1200, 2000 | 211 | 2000 |
| Measurement of elastic modulus, Poisson ratio, and coefficient of thermal expansion of on-wafer submicron films JH Zhao, T Ryan, PS Ho, AJ McKerrow, WY Shih Journal of applied physics 85 (9), 6421-6424, 1999 | 174 | 1999 |
| Mechanical and dielectric properties of pure-silica-zeolite low-k materials Z Li, MC Johnson, M Sun, ET Ryan, DJ Earl, W Maichen, JI Martin, S Li, ... ANGEWANDTE CHEMIE-INTERNATIONAL EDITION IN ENGLISH- 45 (38), 6329, 2006 | 153 | 2006 |
| Absorption and fluorescence studies of acridine in subcritical and supercritical water ET Ryan, T Xiang, KP Johnston, MA Fox The Journal of Physical Chemistry A 101 (10), 1827-1835, 1997 | 112 | 1997 |
| Endothelium-dependent modulation of angiotensin II-induced contraction in blood vessels CA Gruetter, ET Ryan, SM Lemke, DA Bailly, MK Fox, DD Schoepp European journal of pharmacology 146 (1), 85-95, 1988 | 105 | 1988 |
| Probing diffusion barrier integrity on porous silica low-k thin films using positron annihilation lifetime spectroscopy JN Sun, DW Gidley, TL Dull, WE Frieze, AF Yee, ET Ryan, S Lin, J Wetzel Journal of Applied Physics 89 (9), 5138-5144, 2001 | 85 | 2001 |
| Thermomechanical properties and moisture uptake characteristics of hydrogen silsesquioxane submicron films JH Zhao, I Malik, T Ryan, ET Ogawa, PS Ho, WY Shih, AJ McKerrow, ... Applied Physics Letters 74 (7), 944-946, 1999 | 84 | 1999 |
| Materials Issues and Characterization of Low-k Dielectric Materials ET Ryan, AJ McKerrow, J Leu, PS Ho Mrs Bulletin 22 (10), 49-54, 1997 | 75 | 1997 |
| Adjusting the skeleton and pore structure of porous SiCOH dielectrics SM Gates, G Dubois, ET Ryan, A Grill, M Liu, D Gidley Journal of the Electrochemical Society 156 (10), G156, 2009 | 65 | 2009 |
| Advanced multilayer dielectric cap with improved mechanical and electrical properties R Bhatia, G Bonilla, A Grill, JL Herman, S Van Nguyen, ET Ryan, ... US Patent 7,737,052, 2010 | 62 | 2010 |
| Property modifications of nanoporous pSiCOH dielectrics to enhance resistance to plasma-induced damage ET Ryan, SM Gates, A Grill, S Molis, P Flaitz, J Arnold, M Sankarapandian, ... Journal of Applied Physics 104 (9), 2008 | 61 | 2008 |
| Interconnects with a dielectric sealant layer ET Ryan US Patent 6,919,636, 2005 | 61 | 2005 |
| Evaluation of Pore Structure in Pure Silica Zeolite MFI Low-k Thin Films Using Positronium Annihilation Lifetime Spectroscopy S Li, J Sun, Z Li, H Peng, D Gidley, ET Ryan, Yan The Journal of Physical Chemistry B 108 (31), 11689-11692, 2004 | 61 | 2004 |
| Depth-profiling plasma-induced densification of porous low-k thin films using positronium annihilation lifetime spectroscopy JN Sun, DW Gidley, Y Hu, WE Frieze, ET Ryan Applied Physics Letters 81 (8), 1447-1449, 2002 | 58 | 2002 |
| Ruthenium interconnect resistivity and reliability at 48 nm pitch X Zhang, H Huang, R Patlolla, W Wang, FW Mont, J Li, CK Hu, EG Liniger, ... 2016 IEEE international interconnect technology conference/advanced …, 2016 | 52 | 2016 |
| Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: General behavior, practical applications, and atomic models MR Baklanov, V Jousseaume, TV Rakhimova, DV Lopaev, ... Applied Physics Reviews 6 (1), 2019 | 49 | 2019 |
