| Spacer patterning lithography as a new process to induce block copolymer alignment by chemo-epitaxy A Paquet, A Le Pennec, A Gharbi, TJ Giammaria, G Rademaker, ... Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019 …, 2019 | 8 | 2019 |
| Study of plasma etching impact on chemoepitaxy directed self-assembly MG Gusmão Cacho, K Benotmane, A Le Pennec, C Bouet, ... Journal of Vacuum Science & Technology A 39 (3), 2021 | 6 | 2021 |
| Roughness measurement of 2D curvilinear patterns: challenges and advanced methodology J Pradelles, L Perraud, A Fay, E Sezestre, JB Henry, J Bustos, E Guyez, ... Metrology, Inspection, and Process Control for Semiconductor Manufacturing …, 2021 | 4 | 2021 |
| Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography GJ Rademaker, A Le Pennec, TJ Giammaria, K Benotmane, H Pham, ... Advances in Patterning Materials and Processes XXXVII 11326, 163-174, 2020 | 3 | 2020 |
| Block copolymer line roughness measurement via PSD: application to fingerprint samples A Le Pennec, J Rêche, P Quéméré, G Rademaker, R Jarnias, C Bouet, ... Advances in Patterning Materials and Processes XXXVII 11326, 259-268, 2020 | 3 | 2020 |
| Développement de procédés de lithographie avancée par auto-assemblage de copolymères à blocs de haute résolution A Le Pennec Université Grenoble Alpes [2020-....], 2021 | 2 | 2021 |
| Understanding the impact of rinse on SEM image distortion and hole patterning variability E Soltani, B Le-Gratiet, S Bérard-Bergery, J Pradelles, T Bourguignon, ... Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series …, 2023 | | 2023 |
