| Resist outgassing contamination growth results using both photon and electron exposures G Denbeaux, Y Kandel, G Kane, D Alvardo, M Upadhyaya, Y Khopkar, ... Extreme Ultraviolet (EUV) Lithography IV 8679, 126-133, 2013 | 11 | 2013 |
| Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach M Upadhyaya, V Jindal, A Basavalingappa, H Herbol, J Harris-Jones, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 204-217, 2015 | 10 | 2015 |
| Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects M Upadhyaya, A Basavalingappa, H Herbol, G Denbeaux, V Jindal, ... Journal of Vacuum Science & Technology B 33 (2), 2015 | 9 | 2015 |
| Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach M Upadhyaya, V Jindal, A Basavalingappa, H Herbol, J Harris-Jones, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (2), 023505-023505, 2015 | 4 | 2015 |
| Simulation study of cleaning induced extreme ultraviolet reflectivity loss mechanisms on mask blanks M Upadhyaya, G Denbeaux, AJ Kadaksham, V Jindal, JH Jones, B Lee, ... Journal of Vacuum Science & Technology B 30 (5), 2012 | 3 | 2012 |
| Investigating printability of native defects on EUV mask blanks through simulations and experiments M Upadhyaya, V Jindal, H Herbol, IY Jang, HJ Kwon, J Harris-Jones, ... Extreme Ultraviolet (EUV) Lithography V 9048, 851-857, 2014 | 2 | 2014 |
| A simulation study of cleaning induced EUV reflectivity loss mechanisms on mask blanks M Upadhyaya, G Denbeaux, AJ Kadaksham, V Jindal, J Harris-Jones, ... Extreme Ultraviolet (EUV) Lithography III 8322, 636-648, 2012 | 2 | 2012 |
| X‐ray photoelectron spectroscopy process optimization for characterization of trace contamination elements for extreme ultraviolet resist outgassing study M Upadhyaya, Y Kandel, G Denbeaux, C Montgomery, YJ Fan X‐Ray Spectrometry 43 (2), 102-107, 2014 | 1 | 2014 |
| Optimizing XPS tool performance for characterizing trace contamination elements for EUV resist outgas testing M Upadhyaya, Y Kandel, G Denbeaux, C Montgomery, YJ Fan Extreme Ultraviolet (EUV) Lithography IV 8679, 814-825, 2013 | 1 | 2013 |
| Developing particle detection test bench for vacuum components Y Khopkar, H Herbol, M Upadhyaya, G Denbeaux, V Jindal, P Kearney Extreme Ultraviolet (EUV) Lithography III 8322, 660-666, 2012 | 1 | 2012 |
| Level-set multilayer growth model for predicting printability of buried native extreme M Upadhyaya, A Basavalingappa, H Herbol | | 2017 |
| Dependence of contamination rates on key parameters in EUV optics Y Khopkar, P Thomas, L Yankulin, R Garg, C Mbanaso, A Antohe, ... Extreme Ultraviolet (EUV) Lithography II 7969, 704-711, 2011 | | 2011 |
