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Konner E. K. Holden
Konner E. K. Holden
Verified email at lamresearch.com
Title
Cited by
Cited by
Year
Atomic Layer Deposition of Transparent p-Type Semiconducting Nickel Oxide Using Ni(tBu2DAD)2 and Ozone
KEK Holden, CL Dezelah, JF Conley Jr
ACS applied materials & interfaces 11 (33), 30437-30445, 2019
232019
Electrode modulated capacitance-electric field nonlinearity in metal-insulator-metal capacitors
DZ Austin, KEK Holden, J Hinz, JF Conley Jr
Applied Physics Letters 110 (26), 263503, 2017
132017
Characterization of atomic layer deposited semiconducting Co3O4
KEK Holden, JF Conley Jr
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 37 (2 …, 2019
112019
Determination of Hafnium Zirconium Oxide Interfacial Band Alignments Using Internal Photoemission Spectroscopy and X-ray Photoelectron Spectroscopy
MA Jenkins, KEK Holden, SW Smith, MT Brumbach, MD Henry, ...
ACS Applied Materials & Interfaces 13 (12), 14634-14643, 2021
102021
Laminate Al2O3/Ta2O5 Metal/Insulator/Insulator/Metal (MIIM) Devices for High-Voltage Applications
MA Jenkins, DZ Austin, KEK Holden, D Allman, JF Conley
IEEE Transactions on Electron Devices 66 (12), 5260-5265, 2019
72019
Characterization of Atomic Layer Deposited Cobalt Oxide
KEK Holden, MA Jenkins, JF Conley
ECS Transactions 85 (13), 735-741, 2018
72018
Dielectric Relaxation, Aging and Recovery in High-K MIM Capacitors
KEK Holden, GDR Hall, M Cook, C Kendrick, K Pabst, B Greenwood, ...
2021 IEEE International Reliability Physics Symposium (IRPS), 1-10, 2021
6*2021
Precision defect engineering of metal/insulator/metal diodes using atomic layer deposition to localize Ni impurities in Al2O3 tunnel barriers
KEK Holden, Y Qi, JF Conley Jr
Journal of Applied Physics 129 (14), 144502, 2021
42021
Plasma-enhanced atomic layer deposition of WO3-SiO2 films using a heteronuclear precursor
K Mullapudi, KEK Holden, JL Peterson, CL Dezelah, DF Moser, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 41 (1 …, 2023
22023
Ultraviolet photo-enhanced atomic layer deposition for improving dielectric properties of low temperature deposited Al2O3
KEK Holden, SM Witsell, PC Lemaire, JF Conley Jr
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 40 (4 …, 2022
12022
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