| Materials selection rules for amorphous complexion formation in binary metallic alloys JD Schuler, TJ Rupert Acta Materialia 140, 196-205, 2017 | 92 | 2017 |
| Nanocrystalline Al-Mg with extreme strength due to grain boundary doping SC Pun, W Wang, A Khalajhedayati, JD Schuler, JR Trelewicz, TJ Rupert Materials Science and Engineering: A 696, 400-406, 2017 | 71 | 2017 |
| Amorphous complexions enable a new region of high temperature stability in nanocrystalline Ni-W JD Schuler, OK Donaldson, TJ Rupert Scripta Materialia 154, 49-53, 2018 | 57 | 2018 |
| Heavy ion irradiation effects on GaN/AlGaN high electron mobility transistor failure at off-state Z Islam, AL Paoletta, AM Monterrosa, JD Schuler, TJ Rupert, K Hattar, ... Microelectronics Reliability 102, 113493, 2019 | 37 | 2019 |
| Effect of growth temperature on the synthesis of carbon nanotube arrays and amorphous carbon for thermal applications QN Pham, LAS Larkin, CC Lisboa, CB Saltonstall, L Qiu, JD Schuler, ... physica status solidi (a) 214 (7), 1600852, 2017 | 34 | 2017 |
| Amorphous intergranular films mitigate radiation damage in nanocrystalline Cu-Zr JD Schuler, CM Grigorian, CM Barr, BL Boyce, K Hattar, TJ Rupert Acta Materialia, 2020 | 23 | 2020 |
| Identifying interatomic potentials for the accurate modeling of interfacial segregation and structural transitions Y Hu, JD Schuler, TJ Rupert Computational Materials Science 148, 10-20, 2018 | 17 | 2018 |
| In Situ High-Cycle Fatigue Reveals Importance of Grain Boundary Structure in Nanocrystalline Cu-Zr JD Schuler, CM Barr, NM Heckman, G Copeland, BL Boyce, K Hattar, ... JOM 71 (4), 1221-1232, 2019 | 15 | 2019 |
| Method for forming small dimension openings in the organic masking layer of tri-layer lithography JC Arnold, J Schuler, Y Yin US Patent 8,735,283, 2014 | 12 | 2014 |
| Solder volume compensation with C4 process CL Arvin, ED Perfecto, W Sauter, JD Schuler US Patent 8,742,578, 2014 | 10 | 2014 |
| Solder volume compensation with C4 process CL Arvin, ED Perfecto, W Sauter, JD Schuler US Patent 8,742,578, 2014 | 10 | 2014 |
| Substrate including selectively formed barrier layer YM Brovman, BM Erwin, NA Polomoff, JD Schuler, ME Souter, CL Tessler US Patent 9,754,823, 2017 | 6 | 2017 |
| Substrate including selectively formed barrier layer YM Brovman, BM Erwin, NA Polomoff, JD Schuler, ME Souter, CL Tessler US Patent 9,754,823, 2017 | 5 | 2017 |
| Substrate including selectively formed barrier layer YM Brovman, BM Erwin, NA Polomoff, JD Schuler, ME Souter, CL Tessler US Patent 9,754,823, 2017 | 5 | 2017 |
| Solid-state dewetting instability in thermally-stable nanocrystalline binary alloys JD Schuler, G Copeland, K Hattar, TJ Rupert, SA Briggs Materialia, 100618, 2020 | 4 | 2020 |
| Selective plating without photoresist CL Arvin, HD Cox, BM Erwin, JJ Garant, E Misra, NA Polomoff, JD Schuler US Patent App. 14/263,423, 2015 | 4 | 2015 |
| Filtering lead from photoresist stripping solution CL Arvin, HD Cox, AG Merryman, JD Schuler US Patent 9,804,498, 2017 | 1 | 2017 |
| Filtering lead from photoresist stripping solution CL Arvin, HD Cox, AG Merryman, JD Schuler US Patent 9,804,498, 2017 | 1 | 2017 |
| Substrate including selectively formed barrier layer YM Brovman, BM Erwin, NA Polomoff, JD Schuler, ME Souter, CL Tessler US Patent 9,748,135, 2017 | 1 | 2017 |
| Non-transparent microelectronic grade glass as a substrate, temporary carrier or wafer CL Arvin, HD Cox, BM Erwin, JA Lubguban, ED Perfecto, JD Schuler US Patent 9,728,440, 2017 | 1 | 2017 |
Timothy J. RupertProfessor of Materials Science and Engineering, Johns Hopkins University / UC IrvineVerified email at jhu.edu
