| Feed-forward for silicon inspections (DFM2CFM: design to silicon) and feed-back for weakpoint predictor decks (CFM2DFM: silicon to design) guided by marker classification … S SOMANI, S Madhavan, T Herrmann, S SCHÜLER, U Schroeder, ... US Patent 10,095,826, 2018 | 104* | 2018 |
| Growth of epitaxial a-axis and c-axis oriented Sr2RuO4 films S Madhavan, BJ Gibbons, A Dabkowski, HA Dabkowska, ... MRS Online Proceedings Library (OPL) 401, 1995 | 59 | 1995 |
| Methods for quantitatively evaluating the quality of double patterning technology-compliant layouts LT Wang, S Madhavan, L Capodieci US Patent 8,516,407, 2013 | 20 | 2013 |
| Framework for identifying recommended rules and DFM scoring model to improve manufacturability of sub-20nm layout design P Pathak, S Madhavan, S Malik, LTN Wang, L Capodieci Design for Manufacturability through Design-Process Integration VI 8327, 239-251, 2012 | 19 | 2012 |
| Method for forming an integrated circuit device K Ramkumar, CG Kallingal, S Madhavan US Patent 6,534,378, 2003 | 15 | 2003 |
| Methodology to extract, data mine and score geometric constructs from physical design layouts for analysis and applications in semiconductor manufacturing P Pathak, K Krishnamoorthy, WL Wang, YC Lai, FE Gennari, S Somani, ... Design-Process-Technology Co-optimization for Manufacturability X 9781, 77-88, 2016 | 14 | 2016 |
| Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for 10nm technology nodes and beyond LTN Wang, UP Schroeder, Y Woo, J Zeng, S Madhavan, L Capodieci Design-Process-Technology Co-optimization for Manufacturability X 9781, 98-106, 2016 | 10 | 2016 |
| Growth of epitaxial Sr2RuO4 films and YBa2Cu3O7− δSr2RuO4 heterostructures S Madhavan, JA Mitchell, T Nemoto, S Wozniak, Y Liu, DG Schlom, ... Journal of crystal growth 174 (1-4), 417-423, 1997 | 10 | 1997 |
| Electrical transport studies of epitaxial Sr2RuO4 films Y Liu, JA Mitchell, S Madhavan, DG Schlom, A Dabkowski, ... Czechoslovak Journal of Physics 46, 1113-1114, 1996 | 10 | 1996 |
| Stitch insertion for reducing color density differences in double patterning technology (DPT) L Wang, S Madhavan, L Capodieci US Patent 8,918,745, 2014 | 9 | 2014 |
| Body tie test structure for accurate body effect measurement S Madhavan, Q Chen, DA Chan, JS Goo US Patent 7,880,229, 2011 | 9 | 2011 |
| Epitaxial Sr/sub 2/RuO/sub 4/heterostructures S Madhavan, Y Liu, DG Schlom, A Dabkowski, HA Dabkowska, Y Suzuki, ... IEEE transactions on applied superconductivity 7 (2), 2063-2066, 1997 | 8 | 1997 |
| Deep learning-based hotspot prediction of via printability in process window corners P Selvam, P Rezaeifakhr, UP Schroeder, J Bakshi, O Mohamed, ... Design-Process-Technology Co-optimization XV 11614, 173-180, 2021 | 6 | 2021 |
| Hybrid OPC flow with pattern search and replacement P Verma, S Somani, YY Ping, P Pathak, RS Ghaida, CP Babcock, ... Optical Microlithography XXVIII 9426, 254-261, 2015 | 6 | 2015 |
| Pattern-based pre-OPC operation to improve model-based OPC runtime P Verma, F Batarseh, S Somani, J Wang, S McGowan, S Madhavan Photomask Technology 2014 9235, 21-31, 2014 | 6 | 2014 |
| Deriving feature fail rate from silicon volume diagnostics data S Malik, T Herrmann, S Madhavan, R Desineni, C Schuermyer, G Eide IEEE Design & Test 30 (4), 26-34, 2013 | 5 | 2013 |
| Automated yield enhancements implementation on full 28nm chip: challenges and statistics S Malik, S Madhavan, P Pathak, L Capodieci, R Fathy, A Abdulghany Design for Manufacturability through Design-Process Integration VI 8327, 269-277, 2012 | 5 | 2012 |
| Foundry approach for layout risk assessment through comprehensive pattern harvesting and large-scale data analysis MR Babu, S Song, Q Xie, P Rezaeifakhr, E Chiu, JH Park, D Ryan, ... Design-Process-Technology Co-optimization for Manufacturability XIV 11328 …, 2020 | 4 | 2020 |
| A methodology to optimize design pattern context size for higher sensitivity to hotspot detection using pattern association tree (PAT) S Somani, P Pathak, P Verma, S Madhavan, L Capodieci Design-Process-Technology Co-optimization for Manufacturability IX 9427, 212-224, 2015 | 4 | 2015 |
| Timing variability analysis for layout-dependent-effects in 28nm custom and standard cell-based designs P Hurat, RO Topaloglu, R Nachman, P Pathak, J Condella, S Madhavan, ... Design for Manufacturability through Design-Process Integration V 7974, 310-322, 2011 | 4 | 2011 |
