| Integrating photonics with silicon nanoelectronics for the next generation of systems on a chip AH Atabaki, S Moazeni, F Pavanello, H Gevorgyan, J Notaros, L Alloatti, ... Nature 556 (7701), 349-354, 2018 | 790 | 2018 |
| A single-chip optical phased array in a wafer-scale silicon photonics/CMOS 3D-integration platform T Kim, P Bhargava, CV Poulton, J Notaros, A Yaacobi, E Timurdogan, ... IEEE Journal of solid-state circuits 54 (11), 3061-3074, 2019 | 131 | 2019 |
| Fully integrated coherent LiDAR in 3D-integrated silicon photonics/65nm CMOS P Bhargava, T Kim, CV Poulton, J Notaros, A Yaacobi, E Timurdogan, ... 2019 Symposium on VLSI Circuits, C262-C263, 2019 | 51 | 2019 |
| Catalytic and autocatalytic mechanisms of acid amplifiers for use in EUV photoresists SA Kruger, C Higgins, B Cardineau, TR Younkin, RL Brainard Chemistry of Materials 22 (19), 5609-5616, 2010 | 39 | 2010 |
| Synthesis, Characterization, and Reactivity of [Ru(bpy)(CH3CN)3(NO2)]PF6, a Synthon for [Ru(bpy)(L3)NO2] Complexes DA Freedman, S Kruger, C Roosa, C Wymer Inorganic chemistry 45 (23), 9558-9568, 2006 | 36 | 2006 |
| Fluorinated acid amplifiers for EUV lithography S Kruger, S Revuru, C Higgins, S Gibbons, DA Freedman, W Yueh, ... Journal of the American Chemical Society 131 (29), 9862-9863, 2009 | 35 | 2009 |
| RLS tradeoff vs. quantum yield of high PAG EUV resists C Higgins, A Antohe, G Denbeaux, S Kruger, J Georger, R Brainard Alternative Lithographic Technologies 7271, 1118-1129, 2009 | 26 | 2009 |
| Kinetics, chemical modeling and lithography of novel acid amplifiers for use in EUV photoresists R Brainard, S Kruger, C Higgins, S Revuru, S Gibbons, D Freedman, ... Journal of Photopolymer Science and Technology 22 (1), 43-50, 2009 | 20 | 2009 |
| TSV and Cu-Cu direct bond wafer and package-level reliability K Hummler, B Sapp, JR Lloyd, S Kruger, S Olson, SB Park, B Murray, ... 2013 IEEE 63rd Electronic Components and Technology Conference, 41-48, 2013 | 19 | 2013 |
| 29.5 a single-chip optical phased array in a 3D-integrated silicon photonics/65nm CMOS technology T Kim, P Bhargava, CV Poulton, J Notaros, A Yaacobi, E Timurdogan, ... 2019 IEEE International Solid-State Circuits Conference-(ISSCC), 464-466, 2019 | 13 | 2019 |
| Investigation of sensitivity of extreme ultraviolet resists to out-of-band radiation C Mbanaso, G Denbeaux, K Dean, R Brainard, S Kruger, E Hassanein Emerging Lithographic Technologies XII 6921, 1007-1015, 2008 | 13 | 2008 |
| Monolithic optical transceivers in 65 nm bulk CMOS AH Atabaki, S Moazeni, F Pavanello, H Gevorgyan, J Notaros, L Alloatti, ... 2018 Optical Fiber Communications Conference and Exposition (OFC), 1-3, 2018 | 11 | 2018 |
| Synthesis of stable acid amplifiers that produce strong highly-fluorinated polymer-bound acid K Hosoi, B Cardineau, W Earley, S Kruger, K Miyauchi, R Brainard Advances in Resist Materials and Processing Technology XXIX 8325, 476-482, 2012 | 11 | 2012 |
| Stable, fluorinated acid amplifiers for use in EUV lithography S Kruger, K Hosoi, B Cardineau, K Miyauchi, R Brainard Advances in Resist Materials and Processing Technology XXIX 8325, 330-342, 2012 | 10 | 2012 |
| Mass spectrometer characterization of reactions in photoresists exposed to extreme ultraviolet radiation C Mbanaso, S Kruger, C Higgins, Y Khopkar, A Antohe, B Cardineau, ... Extreme Ultraviolet (EUV) Lithography II 7969, 807-815, 2011 | 10 | 2011 |
| Can acid amplifiers help beat the resolution, line edge roughness, and sensitivity trade-off? S Kruger, C Higgins, S Revuru, S Gibbons, D Freedman, RL Brainard Japanese Journal of Applied Physics 49 (4R), 041602, 2010 | 10 | 2010 |
| Understanding ultra-thin film resist and underlayer performance through physical characterization C Higgins, S Kruger, V Kamineni, R Matyi, J Georger, R Brainard Journal of Photopolymer Science and Technology 23 (5), 699-707, 2010 | 8 | 2010 |
| Lithographic evaluation and chemical modeling of acid amplifiers used in EUV photoresists R Brainard, C Higgins, S Kruger, S Revuru, B Cardineau, S Gibbons, ... Advances in Resist Materials and Processing Technology XXVI 7273, 1092-1101, 2009 | 8 | 2009 |
| Lithography and chemical modeling of acid amplifiers for use in EUV photoresists S Kruger, C Higgins, C Gallatin, R Brainard Journal of Photopolymer Science and Technology 24 (2), 143-152, 2011 | 7 | 2011 |
| High frequency electrical characterization of 3D signal/ground through silicon vias S Adamshick, R Carroll, M Rao, D La Tuplie, S Kruger, J Burke, M Liehr Progress In Electromagnetics Research Letters 47, 71-75, 2014 | 6 | 2014 |
