| Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based … L Mai, D Zanders, E Subaşı, E Ciftyurek, C Hoppe, D Rogalla, W Gilbert, ... ACS applied materials & interfaces 11 (3), 3169-3180, 2019 | 34 | 2019 |
| Designing Stability into Thermally Reactive Plumbylenes G Bacic, D Zanders, B Mallick, A Devi, ST Barry Inorganic chemistry 57 (14), 8218-8226, 2018 | 27 | 2018 |
| PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive … D Zanders, E Ciftyurek, E Subaşı, N Huster, C Bock, A Kostka, D Rogalla, ... ACS applied materials & interfaces 11 (31), 28407-28422, 2019 | 23 | 2019 |
| Cobalt metal ALD: Understanding the mechanism and role of zinc alkyl precursors as reductants for low-resistivity Co thin films D Zanders, J Liu, J Obenlüneschloß, C Bock, D Rogalla, L Mai, M Nolan, ... Chemistry of Materials 33 (13), 5045-5057, 2021 | 20 | 2021 |
| Bendable Polycrystalline and Magnetic CoFe2O4 Membranes by Chemical Methods P Salles, R Guzmán, D Zanders, A Quintana, I Fina, F Sánchez, W Zhou, ... ACS applied materials & interfaces 14 (10), 12845-12854, 2022 | 19 | 2022 |
| Atomic layer deposition of dielectric Y 2 O 3 thin films from a homoleptic yttrium formamidinate precursor and water N Boysen, D Zanders, T Berning, SMJ Beer, D Rogalla, C Bock, A Devi RSC advances 11 (5), 2565-2574, 2021 | 19 | 2021 |
| Rational development of guanidinate and amidinate based cerium and ytterbium complexes as atomic layer deposition precursors: synthesis, modeling, and application P Kaur, L Mai, A Muriqi, D Zanders, R Ghiyasi, M Safdar, N Boysen, ... Chemistry–A European Journal 27 (15), 4913-4926, 2021 | 16 | 2021 |
| Synthesis and thermal study of hexacoordinated aluminum (III) triazenides for use in atomic layer deposition R Samii, D Zanders, SC Buttera, V Kessler, L Ojamae, H Pedersen, ... Inorganic Chemistry 60 (7), 4578-4587, 2021 | 16 | 2021 |
| A new metalorganic chemical vapor deposition process for MoS 2 with a 1, 4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur JL Wree, E Ciftyurek, D Zanders, N Boysen, A Kostka, D Rogalla, ... Dalton Transactions 49 (38), 13462-13474, 2020 | 15 | 2020 |
| Synthesis, characterization, and thermal study of divalent germanium, tin, and lead triazenides as potential vapor deposition precursors R Samii, D Zanders, A Fransson, G Bacic, ST Barry, L Ojamae, V Kessler, ... Inorganic Chemistry 60 (17), 12759-12765, 2021 | 14 | 2021 |
| A study on the influence of ligand variation on formamidinate complexes of yttrium: New precursors for atomic layer deposition of yttrium oxide SMJ Beer, N Boysen, A Muriqi, D Zanders, T Berning, D Rogalla, C Bock, ... Dalton Transactions 50 (37), 12944-12956, 2021 | 12 | 2021 |
| A Rare Low‐Spin CoIV Bis(β‐silyldiamide) with High Thermal Stability: Steric Enforcement of a Doublet Configuration D Zanders, G Bačić, D Leckie, O Odegbesan, J Rawson, JD Masuda, ... Angewandte Chemie International Edition 59 (33), 14138-14142, 2020 | 11 | 2020 |
| Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO2 Thin Films: Study of Film … D Zanders, E Ciftyurek, C Hoppe, T de los Arcos, A Kostka, D Rogalla, ... Advanced Materials Interfaces 6 (1), 1801540, 2019 | 11 | 2019 |
| Additive-free spin coating of tin oxide thin films: synthesis, characterization and evaluation of tin β-ketoiminates as a new precursor class for solution deposition processes N Huster, D Zanders, S Karle, D Rogalla, A Devi Dalton Transactions 49 (31), 10755-10764, 2020 | 9 | 2020 |
| Potential precursor alternatives to the pyrophoric trimethylaluminium for the atomic layer deposition of aluminium oxide L Mai, N Boysen, D Zanders, T de Los Arcos, F Mitschker, B Mallick, ... Chemistry–A European Journal 25 (31), 7489-7500, 2019 | 9 | 2019 |
| Silver Thin‐Film Electrodes Grown by Low‐Temperature Plasma‐Enhanced Spatial Atomic Layer Deposition at Atmospheric Pressure T Hasselmann, B Misimi, N Boysen, D Zanders, JL Wree, D Rogalla, ... Advanced Materials Technologies 8 (1), 2200796, 2023 | 8 | 2023 |
| SnO deposition via water based ALD employing tin (ii) formamidinate: precursor characterization and process development N Huster, R Ghiyasi, D Zanders, D Rogalla, M Karppinen, A Devi Dalton Transactions 51 (39), 14970-14979, 2022 | 8 | 2022 |
| Size and shape exclusion in 2D silicon dioxide membranes P Dementyev, N Khayya, D Zanders, I Ennen, A Devi, EI Altman Small 19 (9), 2205602, 2023 | 5 | 2023 |
| Direct‐Patterning ZnO Deposition by Atomic‐Layer Additive Manufacturing Using a Safe and Economical Precursor S Stefanovic, N Gheshlaghi, D Zanders, I Kundrata, B Zhao, MKS Barr, ... Small 19 (36), 2301774, 2023 | 4 | 2023 |
| Synthesis, Structure, and Thermal Properties of Volatile Group 11 Triazenides as Potential Precursors for Vapor Deposition R Samii, A Fransson, P Mpofu, P Niiranen, L Ojamäe, V Kessler, ... Inorganic Chemistry 61 (51), 20804-20813, 2022 | 3 | 2022 |
