| Shot noise, LER, and quantum efficiency of EUV photoresists RL Brainard, P Trefonas, JH Lammers, CA Cutler, JF Mackevich, ... Emerging Lithographic Technologies VIII 5374, 74-85, 2004 | 215 | 2004 |
| Statistical simulation of resist at EUV and ArF JJ Biafore, MD Smith, CA Mack, JW Thackeray, R Gronheid, ... Advances in Resist Materials and Processing Technology XXVI 7273, 1207-1216, 2009 | 73 | 2009 |
| Omega-3 fatty acids and cardiovascular disease: an updated systematic review. EM Balk, GP Adams, V Langberg, C Halladay, M Chung, L Lin, ... Evidence report/technology assessment, 1-1252, 2016 | 64 | 2016 |
| Comparison of simulation approaches for chemically amplified resists A Erdmann, W Henke, SA Robertson, E Richter, B Tollkuehn, W Hoppe Lithography for Semiconductor Manufacturing II 4404, 99-110, 2001 | 53 | 2001 |
| Mechanistic simulation of line-edge roughness JJ Biafore, MD Smith, SA Robertson, T Graves Advances in Resist Materials and Processing Technology XXIV 6519, 351-367, 2007 | 43 | 2007 |
| Resist pattern prediction at EUV JJ Biafore, MD Smith, E van Setten, T Wallow, P Naulleau, D Blankenship, ... Extreme Ultraviolet (EUV) Lithography 7636, 250-259, 2010 | 41 | 2010 |
| Toward a universal resist dissolution model for lithography simulation SA Robertson, CA Mack, MJ Maslow Lithography for Semiconductor Manufacturing II 4404, 111-122, 2001 | 36 | 2001 |
| Physical resist simulation for a negative tone development process S Robertson, M Reilly, Y Bae 2010 International Symposium on Lithography Extension, 2010 | 34 | 2010 |
| Improved notch model for resist dissolution in lithography simulation SA Robertson, EK Pavelchek, W Hoppe, R Wildfeuer Advances in Resist Technology and Processing XVIII 4345, 912-920, 2001 | 32 | 2001 |
| Negative tone development: gaining insight through physical simulation SA Robertson, M Reilly, JJ Biafore, MD Smith, Y Bae Advances in Resist Materials and Processing Technology XXVIII 7972, 283-293, 2011 | 26 | 2011 |
| Techniques for directly measuring the absorbance of photoresists at EUV wavelengths M Chandhok, H Cao, W Yueh, EM Gullikson, RL Brainard, SA Robertson Emerging Lithographic Technologies VIII 5374, 861-868, 2004 | 20 | 2004 |
| Compositions and processes for immersion lithography MK Gallagher, GB Wayton, GP Prokopowicz, SA Robertson US Patent 7,781,141, 2010 | 19 | 2010 |
| The plant-derived naphthoquinone droserone inhibits in vitro measles virus infection C Lieberherr, G Zhang, A Grafen, K Singethan, S Kendl, V Vogt, J Maier, ... Planta Medica 83 (03/04), 232-238, 2017 | 17 | 2017 |
| Crystal structure of droserone in “biogenic crystals” found under the stem bark of Ancistvocladus robertsoniorum1 K Peters, EM Peters, HG Von Schnering, G Bringmann, C Kehr, RD Haller, ... Zeitschrift für Kristallographie-Crystalline Materials 210 (4), 290-291, 1995 | 17 | 1995 |
| New methods to calibrate simulation parameters for chemically amplified resists B Tollkuehn, A Erdmann, N Kivel, SA Robertson, D Kang, SG Hansen, ... Optical Microlithography XV 4691, 1168-1179, 2002 | 16 | 2002 |
| Comparative stochastic process variation bands for N7, N5, and N3 at EUV AV Pret, T Graves, D Blankenship, K Bai, S Robertson, P De Bisschop, ... Extreme Ultraviolet (EUV) Lithography IX 10583, 131-141, 2018 | 15 | 2018 |
| The accuracy of a calibrated PROLITH physical resist model across illumination conditions JJ Biafore, SA Robertson, MD Smith, C Sallee Design for Manufacturability through Design-Process Integration 6521, 459-466, 2007 | 15 | 2007 |
| Design of a cost-effective multiwavelength development rate monitoring tool SA Scheer, CJ Brodsky, SA Robertson, D Kang Metrology, Inspection, and Process Control for Microlithography XVI 4689 …, 2002 | 15 | 2002 |
| Effects of mask bias on the mask error enhancement factor (MEEF) of contact holes D Kang, SA Robertson, MT Reilly, EK Pavelchek Optical Microlithography XIV 4346, 858-868, 2001 | 15 | 2001 |
| Stochastic simulation of resist linewidth roughness and critical dimension uniformity for optical lithography SA Robertson, JJ Biafore, MD Smith, MT Reilly, J Wandell Journal of Micro/Nanolithography, MEMS and MOEMS 9 (4), 041212-041212-7, 2010 | 14 | 2010 |
