| Farbication of UV photodetector from nickel oxide nanoparticles deposited on silicon substrate by closed-field unbalanced dual magnetron sputtering techniques OA Hammadi, MK Khalaf, FJ Kadhim Optical and Quantum Electronics 47, 3805-3813, 2015 | 98 | 2015 |
| Fabrication and characterization of ultraviolet photodetectors based on silicon nitride nanostructures prepared by magnetron sputtering OA Hammadi, MK Khalaf, FJ Kadhim Proceedings of the Institution of Mechanical Engineers, Part N: Journal of …, 2016 | 78 | 2016 |
| Operation Characteristics of a Closed-Field Unbalanced Dual-Magnetrons Plasma Sputtering System. OA Hamadi, MK Khalaf, FJ Kadhim, BT Chiad Bulgarian Journal of Physics 41 (1), 2014 | 60 | 2014 |
| Silicon nitride nanostructures prepared by reactive sputtering using closed-field unbalanced dual magnetrons OA Hammadi, MK Khalaf, FJ Kadhim Proceedings of the Institution of Mechanical Engineers, Part L: Journal of …, 2017 | 54 | 2017 |
| Fabrication of ZnO@ ZIF-8 gas sensors for selective gas detection AI Khudiar, AK Elttayef, MK Khalaf, AM Oufi Materials Research Express 6 (12), 126450, 2020 | 37 | 2020 |
| Influence of nanocrystalline size on optical band gap in CdSe thin films prepared by DC sputtering MK Khalaf, BAM ALhilli, AI Khudiar, A Abd Alzahra Photonics and Nanostructures-Fundamentals and Applications 18, 59-66, 2016 | 31 | 2016 |
| Studying the non-thermal plasma jet characteristics and application on bacterial decontamination AF Al-Rawaf, FK Fuliful, MK Khalaf, HK Oudah Journal of Theoretical and Applied Physics 12 (1), 45-51, 2018 | 30 | 2018 |
| Construction and characterization of a low pressure plasma reactor using DC glow discharge BT Chiad, TL Al-Zubaydi, MK Khalaf, AI Khudiar Journal of Optoelectronics and Biomedical Materials 1 (3), 255-262, 2009 | 24 | 2009 |
| Improvement of the sensing characterizations of ZnO nanostructure by using thermal annealing prepared through RF magnetron sputtering technique AI Khudiar, MK Khalaf, AM Ofui Optical Materials 114, 110885, 2021 | 21 | 2021 |
| Characterization of low pressure plasma-dc glow discharges (Ar, SF6 and SF6/He) for Si etching B T Chiad, T L Al-zubaydib, MK Khalaf, A I Khudiar NISCAIR-CSIR, India, 2010 | 19 | 2010 |
| Influence of RF sputtering power on surface properties and biocompatibility of 316L stainless steel alloy by deposition of TiO2 thin films MK Khalaf, SN Mazhir, MS Mahdi, SK Taha, M Bououdina Materials Research Express 6 (3), 035401, 2018 | 17 | 2018 |
| Effect of radio frequency magnetron sputtering power on structural and optical properties of Ti6Al4V thin films MK Khalaf, HF Al-Taay, DS Ali Photonic Sensors 7, 163-170, 2017 | 16 | 2017 |
| Influence of discharge voltage on the sensitivity of the resultant sputtered NiO thin films toward hydrogen gas MK Khalaf, RH Mutlak, AI Khudiar, QG Hial Physica B: Condensed Matter 514, 78-84, 2017 | 16 | 2017 |
| Characteristics and operation conditions of a closed-field unbalanced dual magnetrons plasma sputtering system BT Chiad, MK Khalaf, FJ Kadhim, OA Hammadi Open Access Library J 1 (6), 1-7, 2014 | 13 | 2014 |
| DC glow discharge plasma characteristics in Ar/O2 gas mixture YK Jabur, MG Hammed, MK Khalaf Iraqi Journal of Science, 475-482, 2021 | 12 | 2021 |
| A Study of Plasma parameters in gold sputtering System by Means of Optical Emission Spectroscopy SN Mazhir, SK Taha, NH Harb, MK Khalaf IOP Conference Series: Materials Science and Engineering 871 (1), 012081, 2020 | 10 | 2020 |
| Measurement of plasma electron temperature and density by using different applied voltages and working pressures in a magnetron sputtering system SN Mazhir, MK Khalaf, SK Taha, HK Mohsin Int. J. Eng. Technol 7, 1177-1180, 2018 | 10 | 2018 |
| Current-voltage characteristics of dc plasma discharges employed in sputtering techniques MK Khalaf, OA Hammadi, FJ Kadhim Iraqi Journal of Applied Physics 12 (3), 2016 | 10 | 2016 |
| Crystalline structure and surface morphology of tin oxide films grown by DC reactive sputtering MK Khalaf, NA Al-Tememee, FT Ibrahim, MA Hameed Photonic Sensors 4, 349-353, 2014 | 10 | 2014 |
| Electrical Characteristics and plasma diagnostics of (Ar/O2) gas mixture glow discharge MK Khalaf, IR Agool, SH Abd Muslim Int. J. Appl. Innov. Eng. Manag 3, 113-119, 2014 | 9 | 2014 |
