| Chemical vapour deposition: precursors, processes and applications M Ritala, H Parala, R Kanjolia, RD Dupuis, SE Alexandrov, SJC Irvine, ... Royal Society of Chemistry, 2008 | 126 | 2008 |
| Chemical vapor deposition enhanced by atmospheric pressure non‐thermal non‐equilibrium plasmas SE Alexandrov, ML Hitchman Chemical Vapor Deposition 11 (11‐12), 457-468, 2005 | 124 | 2005 |
| Remote AP‐PECVD of Silicon Dioxide Films from Hexamethyldisiloxane (HMDSO) SE Alexandrov, N McSporran, ML Hitchman Chemical Vapor Deposition 11 (11‐12), 481-490, 2005 | 97 | 2005 |
| Portable optoelectronic gas sensors operating in the mid-IR spectral range (lambda= 3 5 um) SE Alexandrov, GA Gavrilov, AA Kapralov, SA Karandashev, BA Matveev, ... Second International Conference on Lasers for Measurement and Information …, 2002 | 43 | 2002 |
| Formation of silicon nitride films by remote plasma‐enhanced chemical vapour deposition SE Alexandrov, ML Hitchman, S Shamlian Advanced Materials for Optics and Electronics 2 (6), 301-312, 1993 | 43 | 1993 |
| High-temperature etching of SiC in SF6/O2 inductively coupled plasma AA Osipov, GA Iankevich, AB Speshilova, AA Osipov, EV Endiiarova, ... Scientific reports 10 (1), 19977, 2020 | 40 | 2020 |
| New approaches to titania and silica CVD ML Hitchman, SE Alexandrov The Electrochemical Society Interface 10 (2), 40, 2001 | 24 | 2001 |
| A study by In Situ FTIR Spectroscopy of the Decomposition of Precursors for the MOCVD of High Temperature Superconductors AY Kovalgin, F Chabert-Rocabois, ML Hitchman, SH Shamlian, ... Le Journal de Physique IV 5 (C5), C5-357-C5-364, 1995 | 22 | 1995 |
| CVD deposited titania thin films for gas sensors with improved operating characteristics MV Baryshnikova, LA Filatov, AS Petrov, SE Alexandrov Chemical Vapor Deposition 21 (10-11-12), 327-333, 2015 | 20 | 2015 |
| Plasma-etching of 2D-poled glasses: A route to dry lithography SE Alexandrov, AA Lipovskii, AA Osipov, IV Reduto, DK Tagantsev Applied Physics Letters 111 (11), 2017 | 19 | 2017 |
| Atmospheric pressure plasma enhanced CVD of Fe nanoparticles S Alexandrov, I Kretusheva, MV Mishin ECS Transactions 25 (8), 943, 2009 | 19 | 2009 |
| Low-temperature plasma-chemical deposition of nanocomposite antifriction molybdenum disulfide (filler)–silicon oxide (matrix) coatings SE Alexandrov, KS Tyurikov, AD Breki Russian Journal of Applied Chemistry 90, 1753-1759, 2017 | 18 | 2017 |
| The effect of a lithium niobate heating on the etching rate in SF6 ICP plasma AA Osipov, SE Alexandrov, GA Iankevich Materials Research Express 6 (4), 046306, 2019 | 17 | 2019 |
| Chemical Vapor Deposition of Ni–C Films from Bis-(Ethylcyclopentadienyl) Nickel SE Alexandrov, VS Protopopova Journal of nanoscience and nanotechnology 11 (9), 8259-8263, 2011 | 17 | 2011 |
| Low‐Temperature Atmospheric Pressure Plasma‐Enhanced CVD of Nanocomposite Coatings “Molybdenum Disulfide (Filler)–Silicon Oxide (Matrix)” SE Alexandrov, KS Tyurikov, DA Kirilenko, AV Redkov, AA Lipovskii Advanced Materials Interfaces 4 (18), 1700241, 2017 | 16 | 2017 |
| Kinetic study of MOCVD of NiO films from bis‐(ethylcyclopentadienyl) nickel AS Kondrateva, M Mishin, A Shakhmin, M Baryshnikova, SE Alexandrov physica status solidi (c) 12 (7), 912-917, 2015 | 16 | 2015 |
| Remote PECVD: a route to controllable plasma deposition SE Alexandrov Le Journal de Physique IV 5 (C5), C5-567-C5-582, 1995 | 16 | 1995 |
| Remote plasma-enhanced chemical vapour deposition of silicon nitride films: the effect of diluting nitrogen with helium SE Alexandrov, ML Hitchman, SH Shamlian Journal of Materials Chemistry 5 (3), 457-460, 1995 | 16 | 1995 |
| Fast and Controllable Synthesis of Core–Shell Fe3O4–C Nanoparticles by Aerosol CVD IA Tyurikova, SE Alexandrov, KS Tyurikov, DA Kirilenko, AB Speshilova, ... ACS omega 5 (14), 8146-8150, 2020 | 14 | 2020 |
| Monocrystalline quartz ICP etching: Road to high-temperature dry etching AA Osipov, GA Iankevich, SE Alexandrov Plasma Chemistry and Plasma Processing 40, 423-431, 2020 | 14 | 2020 |
