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Dr. Rao Morusupalli
Dr. Rao Morusupalli
Stanford University, Materials Science and Engineering
Verified email at alumni.stanford.edu
Title
Cited by
Cited by
Year
On the mechanical stresses of cu through-silicon via (tsv) samples fabricated by sk hynix vs. sematech–enabling robust and reliable 3-d interconnect/integrated circuit (ic …
T Tian, R Morusupalli, H Shin, HY Son, KY Byun, YC Joo, R Caramto, ...
Procedia Engineering 139, 101-111, 2016
392016
Critical temperature shift for Stress Induced Voiding in advanced Cu interconnects for 32 nm and beyond
R Morusupalli, R Rao, TK Lee, YL Shen, M Kunz, N Tamura, AS Budiman
2012 IEEE International Reliability Physics Symposium (IRPS), EM. 8.1-EM. 8.3, 2012
62012
Comparison of Line stress predictions with measured electromigration failure times
RR Morusupalli, WD Nix, JR Patel
2007 IEEE International Integrated Reliability Workshop Final Report, 124-127, 2007
32007
Addressing IC component Quality and Reliability assurance challenges
SJ Wen, RR Morusupalli, M Hartranft
2009 IEEE International Reliability Physics Symposium, 810-813, 2009
22009
Tae-Kyu Lee; Yu-Lin Shen; Kunz, M.; Tamura, N.; Budiman, AS “Critical temperature shift for Stress Induced Voiding in Advanced Cu Interconnects for 32 nm and beyond”
R Morusupalli, R Rao
IEEE IRPS, Pages EM, 0
2
Critical temperature shift for stress induced voiding in advanced Cu interconnects for 32 nm and beyond
R Morusupalli, R Rao, TK Lee, YL Shen, M Kunz, N Tamura, AS Budiman
Procedia Engineering 139, 32-40, 2016
12016
From Early Discoveries to a New Hypothesis-A Brief History of Atomic Magnetism and Magnetic Monopoles
RR Morusupalli
2023 8th IEEE History of Electrotechnology Conference (HISTELCON), 11-15, 2023
2023
Impact of Lorentz Force On Atomic Flux During Electromigration
RR Morusupalli, DL Littlefield, WD Nix
2021 IEEE International Integrated Reliability Workshop (IIRW), 1-4, 2021
2021
Plasticity and Reliability: From Unexpected Plasticity-Induced Damages in Advanced Cu Interconnects to Novel Reliability Phenomena in 3-D Interconnect Schemes Using Through …
A Budiman, R Morusupalli, TK Lee, YL Shen, SH Hwang, BJ Kim, HY Son, ...
Minerals, Metals and Materials Society/AIME, 420 Commonwealth Dr., P. O. Box …, 2011
2011
Plastic Relaxation during Thermal Loading in Advanced Cu Interconnects at Intermediate Temperatures: Implications for Stress-induced Voiding (SIV) in Advanced Interconnect Nodes
R Morusupalli
Advanced Metallization Conference 2010, 51-53, 2010
2010
2007 IIRW Attendees
S Kayali, R Brynsvold, M Yap, D Turner, R Morusupalli, S Pae, A Johnston, ...
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