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Dhairya Dixit
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Nonconventional applications of Mueller matrix-based scatterometry for advanced technology nodes
D Dixit, N Keller, Y Lifshitz, T Kagalwala, A Elia, V Todi, J Fronheiser, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 17 (3), 034001-034001, 2018
222018
Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology
D Dixit, S O’Mullane, S Sunkoju, A Gottipati, ER Hosler, V Kamineni, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (3), 031208-031208, 2015
222015
Optical critical dimension metrology for directed self-assembly assisted contact hole shrink
D Dixit, A Green, ER Hosler, V Kamineni, ME Preil, N Keller, J Race, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (1), 014004, 2016
202016
Metrology for block copolymer directed self-assembly structures using Mueller matrix-based scatterometry
DJ Dixit, V Kamineni, R Farrell, ER Hosler, M Preil, J Race, B Peterson, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (2), 10, 2015
202015
Advanced applications of scatterometry based optical metrology
D Dixit, N Keller, T Kagalwala, F Recchia, Y Lifshitz, A Elia, V Todi, ...
Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017
142017
Mueller matrix optical scatterometry of Si fins patterned using directed self-assembly block copolymer line arrays
D Dixit, M Medikonda, AC Diebold, B Peterson, J Race
25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014 …, 2014
112014
Spectroscopic ellipsometry studies of 3-stage deposition of CuIn1− xGaxSe2 on Mo-coated glass and stainless steel substrates
S Sunkoju, S Schujman, D Dixit, A Diebold, J Li, R Collins, P Haldar
Thin Solid Films 606, 113-119, 2016
92016
Metrology for directed self-assembly block lithography using optical scatterometry
D Dixit, V Kamineni, R Farrell, E Hosler, M Preil, J Race, B Peterson, ...
Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014
92014
Correlation study of actual temperature profile and in-line metrology measurements for within-wafer uniformity improvement and wafer edge yield enhancement
F Fang, A Vaid, A Vinslava, R Casselberry, S Mishra, D Dixit, P Timoney, ...
Metrology, Inspection, and Process Control for Microlithography XXXII 10585 …, 2018
72018
Advancements in ellipsometric and scatterometric analysis
S O’Mullane, D Dixit, AC Diebold, Z Ma, DG Seiler
Metrology and diagnostic techniques for nanoelectronics, 65-108, 2017
72017
Characterization of Overlay and Tilt in Advanced Technology Nodes using Scatterometry
AV Dhairya Dixit, Sonal Dey, Taher Kagalwala, Padraig Timoney, Yudesh ...
2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2019
62019
Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry
D Dixit, S O'Mullane, S Sunkoju, ER Hosler, V Kamineni, M Preil, N Keller, ...
SPIE 9424, 2015
42015
Optical metrology for directed self-assembly patterning using Mueller matrix spectroscopic ellipsometry based scatterometry
DJ Dixit
State University of New York at Albany, 2015
32015
Metrology manufacturing control factors: A holistic approach for supporting 14nm and 7nm
D Jayez, A Vaid, E Solecky, M Lenahan, D Dixit, C Largo, G Vakas, ...
2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2017
22017
Optical CD metrology for directed self-assembly assisted contact hole shrink process
D Dixit, ER Hosler, M Preil, N Keller, J Race, JS Chun, M O’Sullivan, ...
Metrology, Inspection, and Process Control for Microlithography XXIX 9424 …, 2015
22015
Process control of semiconductor fabrication based on linkage between different fabrication steps
P Timoney, T Kagalwala, A Vaid, S Mahendrakar, D Dixit, S Yogev, ...
US Patent App. 16/288,152, 2020
2020
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