| Fully CMOS-compatible passive TiO2-based memristor crossbars for in-memory computing A El Mesoudy, G Lamri, R Dawant, J Arias-Zapata, P Gliech, Y Beilliard, ... Microelectronic Engineering 255, 111706, 2022 | 20 | 2022 |
| Analog programming of CMOS-compatible Al2O3/TiO2− x memristor at 4.2 K after metal-insulator transition suppression by cryogenic reforming PA Mouny, R Dawant, B Galaup, S Ecoffey, M Pioro-Ladrière, Y Beilliard, ... Applied Physics Letters 123 (16), 2023 | 2 | 2023 |
| Memristor-based cryogenic programmable DC sources for scalable in situ quantum-dot control PA Mouny, Y Beilliard, S Graveline, MA Roux, A El Mesoudy, R Dawant, ... IEEE Transactions on Electron Devices 70 (4), 1989-1995, 2023 | 2 | 2023 |
| Multiple material stack grayscale patterning using electron-beam lithography and a single plasma etching step R Dawant, S Ecoffey, D Drouin Journal of Vacuum Science & Technology B 40 (6), 2022 | 2 | 2022 |
| Damascene versus subtractive line CMP process for resistive memory crossbars BEOL integration R Dawant, M Gaudreau, MA Roy, PA Mouny, M Valdenaire, P Gliech, ... Micro and Nano Engineering, 100251, 2024 | 1 | 2024 |
| Hybrid cross correlation and line-scan alignment strategy for CMOS chips electron-beam lithography processing R Dawant, R Seils, S Ecoffey, R Schmid, D Drouin Journal of Vacuum Science & Technology B 40 (1), 2022 | 1 | 2022 |
| Towards scalable cryogenic quantum dot biasing using memristor-based DC sources PA Mouny, R Dawant, P Dufour, M Valdenaire, S Ecoffey, ... arXiv preprint arXiv:2404.10694, 2024 | | 2024 |
| Hardware-aware Training Techniques for Improving Robustness of Ex-Situ Neural Network Transfer onto Passive TiO2 ReRAM Crossbars P Drolet, R Dawant, V Yon, PA Mouny, M Valdenaire, JA Zapata, P Gliech, ... arXiv preprint arXiv:2305.18495, 2023 | | 2023 |
| 3D shaping of multi-layers stack using a single plasma etching step and greyscaleelectron-beam lithography R Dawant, S Ecoffey, D Drouin 65th International Conference on Electron, Ion and Photon Beam Technology …, 2022 | | 2022 |
| Comparison of alignment markers and method for electron-beam lithography on CMOS dies. R Dawant, S Ecoffey, R Seils, R Schmid, D Drouin The 64th International Conference on Electron, Ion and Photon Beam …, 2021 | | 2021 |
| " Spin wave emission by spin transfer torque for beyond CMOS logic application R Dawant, F Ciubotaru, L Piraux | | |
