| Methods and apparatus for depositing a chalcogenide film and structures including the film M Mattinen, M Ritala, M Leskelä US Patent App. 17/007,221, 2021 | 210 | 2021 |
| Atomic Layer Deposition of Crystalline MoS2 Thin Films: New Molybdenum Precursor for Low‐Temperature Film Growth M Mattinen, T Hatanpää, T Sarnet, K Mizohata, K Meinander, PJ King, ... Advanced Materials Interfaces 4 (18), 1700123, 2017 | 132 | 2017 |
| Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics M Mattinen, G Popov, M Vehkamäki, PJ King, K Mizohata, P Jalkanen, ... Chemistry of Materials 31 (15), 5713-5724, 2019 | 88 | 2019 |
| Atomic layer deposition of optoelectronic materials M Leskelä, M Mattinen, M Ritala Journal of Vacuum Science & Technology B 37 (3), 2019 | 74 | 2019 |
| Atomic layer deposition of rhenium disulfide J Hämäläinen, M Mattinen, K Mizohata, K Meinander, M Vehkamäki, ... Advanced Materials 30 (24), 1703622, 2018 | 73 | 2018 |
| Atomic Layer Deposition of PbI2 Thin Films G Popov, M Mattinen, T Hatanpää, M Vehkamäki, M Kemell, ... Chemistry of Materials 31 (3), 1101-1109, 2019 | 61 | 2019 |
| Low‐Temperature Wafer‐Scale Deposition of Continuous 2D SnS2 Films M Mattinen, PJ King, L Khriachtchev, K Meinander, JT Gibbon, ... Small 14 (21), 1800547, 2018 | 60 | 2018 |
| Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealing M Mattinen, PJ King, L Khriachtchev, MJ Heikkilä, B Fleming, ... Materials today chemistry 9, 17-27, 2018 | 57 | 2018 |
| Scalable Route to the Fabrication of CH3NH3PbI3 Perovskite Thin Films by Electrodeposition and Vapor Conversion G Popov, M Mattinen, ML Kemell, M Ritala, M Leskelä ACS omega 1 (6), 1296-1306, 2016 | 52 | 2016 |
| Atomic layer deposition of 2D metal dichalcogenides for electronics, catalysis, energy storage, and beyond M Mattinen, M Leskelä, M Ritala Advanced Materials Interfaces 8 (6), 2001677, 2021 | 50 | 2021 |
| Atomic Layer Deposition of Photoconductive Cu2O Thin Films T Iivonen, MJ Heikkilä, G Popov, HE Nieminen, M Kaipio, M Kemell, ... ACS omega 4 (6), 11205-11214, 2019 | 43 | 2019 |
| Nucleation and conformality of iridium and iridium oxide thin films grown by atomic layer deposition M Mattinen, J Hamalainen, F Gao, P Jalkanen, K Mizohata, J Raisanen, ... Langmuir 32 (41), 10559-10569, 2016 | 41 | 2016 |
| Diamine adduct of cobalt (II) chloride as a precursor for atomic layer deposition of stoichiometric cobalt (II) oxide and reduction thereof to cobalt metal thin films K Väyrynen, T Hatanpää, M Mattinen, M Heikkilä, K Mizohata, ... Chemistry of Materials 30 (10), 3499-3507, 2018 | 38 | 2018 |
| Atomic layer deposition of molybdenum and tungsten oxide thin films using heteroleptic imido-amidinato precursors: process development, film characterization, and gas sensing … M Mattinen, JL Wree, N Stegmann, E Ciftyurek, ME Achhab, PJ King, ... Chemistry of Materials 30 (23), 8690-8701, 2018 | 37 | 2018 |
| Atomic layer deposition of iridium thin films using sequential oxygen and hydrogen pulses M Mattinen, J Hämäläinen, M Vehkamäki, MJ Heikkilä, ... The Journal of Physical Chemistry C 120 (28), 15235-15243, 2016 | 33 | 2016 |
| Atomic Layer Deposition and Characterization of Bi2Te3 Thin Films T Sarnet, T Hatanpää, E Puukilainen, M Mattinen, M Vehkamäki, ... The Journal of Physical Chemistry A 119 (11), 2298-2306, 2015 | 33 | 2015 |
| Rhenium metal and rhenium nitride thin films grown by atomic layer deposition J Hämäläinen, K Mizohata, K Meinander, M Mattinen, M Vehkamäki, ... Angewandte Chemie 130 (44), 14746-14750, 2018 | 30 | 2018 |
| Atomic layer deposition of tin oxide thin films from bis [bis (trimethylsilyl) amino] tin (II) with ozone and water J Tupala, M Kemell, M Mattinen, K Meinander, S Seppälä, T Hatanpää, ... Journal of Vacuum Science & Technology A 35 (4), 2017 | 28 | 2017 |
| Atomic layer deposition of PbS thin films at low temperatures G Popov, G Bačić, M Mattinen, T Manner, H Lindström, H Seppänen, ... Chemistry of Materials 32 (19), 8216-8228, 2020 | 26 | 2020 |
| Low-temperature atomic layer deposition of copper (II) oxide thin films T Iivonen, J Hämäläinen, B Marchand, K Mizohata, M Mattinen, G Popov, ... Journal of Vacuum Science & Technology A 34 (1), 2016 | 23 | 2016 |
