| Mid-chamber gas distribution plate, tuned plasma flow control grid and electrode AM Paterson, JP Holland, T Panagopoulos, EP Hammond, BK Hatcher, ... US Patent App. 11/998,468, 2008 | 612 | 2008 |
| Process for selectively etching dielectric layers CL Hsieh, J Yuan, H Chen, T Panagopoulos, Y Ye US Patent 6,905,968, 2005 | 246 | 2005 |
| Plasma process employing multiple zone gas distribution for improved uniformity of critical dimension bias D Katz, D Palagashvili, BK Hatcher, T Panagopoulos, VN Todorow, ... US Patent App. 12/143,146, 2009 | 233 | 2009 |
| Substrate processing with rapid temperature gradient control A Matyushkin, D Katz, J Holland, T Panagopoulos, MD Willwerth US Patent 9,275,887, 2016 | 206 | 2016 |
| Rapid and uniform gas switching for a plasma etch process T Panagopoulos US Patent 8,133,349, 2012 | 196 | 2012 |
| Substrate support with electrostatic chuck having dual temperature zones A Matyushkin, D Koosau, T Panagopoulos, J Holland US Patent 8,226,769, 2012 | 194 | 2012 |
| Electrostatic chuck having a plurality of heater coils A Matyushkin, D Koosau, T Panagopoulos, J Holland US Patent 8,663,391, 2014 | 185 | 2014 |
| Plasma sheath model and ion energy distribution for all radio frequencies T Panagopoulos, DJ Economou Journal of applied physics 85 (7), 3435-3443, 1999 | 171 | 1999 |
| Method and apparatus for controlling temperature of a substrate J Holland, T Panagopoulos US Patent 7,544,251, 2009 | 154 | 2009 |
| Method and apparatus for controlling temperature of a substrate J Holland, T Panagopoulos US Patent 8,075,729, 2011 | 99 | 2011 |
| Method of processing a workpiece using a mid-chamber gas distribution plate, tuned plasma flow control grid and electrode AM Paterson, JP Holland, T Panagopoulos, EP Hammond, BK Hatcher, ... US Patent App. 11/998,458, 2008 | 87 | 2008 |
| Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency A Paterson, VN Todorow, T Panagopoulos, BK Hatcher, D Katz, ... US Patent 7,645,357, 2010 | 82 | 2010 |
| Plasma control using dual cathode frequency mixing SC Shannon, DS Grimard, T Panagopoulos, DJ Hoffman, MG Chafin, ... US Patent 7,838,430, 2010 | 80 | 2010 |
| Three-dimensional simulation of an inductively coupled plasma reactor T Panagopoulos, D Kim, V Midha, DJ Economou Journal of applied physics 91 (5), 2687-2696, 2002 | 71 | 2002 |
| Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution A Paterson, VN Todorow, T Panagopoulos, BK Hatcher, D Katz, ... US Patent 7,780,864, 2010 | 64 | 2010 |
| Method and apparatus for controlling temperature of a substrate J Holland, T Panagopoulos, A Matyushkin, D Katz, MF Hegarty, ... US Patent 7,436,645, 2008 | 61 | 2008 |
| Plasma reactor apparatus with independent capacitive and inductive plasma sources A Paterson, V Todorow, T Panagopoulos, B Hatcher, D Katz, E Hammond, ... US Patent App. 11/410,784, 2007 | 58 | 2007 |
| Chamber with vertical support stem for symmetric conductance and RF delivery DA Brown, JP Holland, MC Kellogg, JE Tappan, JK Antolik, I Kenworthy, ... US Patent 10,049,862, 2018 | 47 | 2018 |
| Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias D Katz, D Palagashvili, BK Hatcher, T Panagopoulos, VN Todorow, ... US Patent 8,236,133, 2012 | 46 | 2012 |
| Plasma reactor apparatus with independent capacitive and toroidal plasma sources A Paterson, VN Todorow, T Panagopoulos, BK Hatcher, D Katz, ... US Patent 7,264,688, 2007 | 42 | 2007 |
