Jeffrey Hopwood

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Felipe IzaLoughborough UniversityVerified email at lboro.ac.uk
Jes AsmussenProfessorVerified email at egr.msu.edu
Stephen ParsonsRiverside ResearchVerified email at riversideresearch.org
Stephen RossnagelUVA Dept Mat. Sci.Verified email at virginia.edu
J. XueApplied Materials Inc.Verified email at amat.com
Sameer SonkusaleTufts University, Electrical and Computer, Biomedical, Chemical and Biological EngineeringVerified email at ece.tufts.edu
Pramod Singhpramodsingh.mt@gmail.comVerified email at eecs.tufts.edu
Michael HeavenProfessor of Chemistry, Emory UniversityVerified email at emory.edu
Michael LanaganPenn State UniversityVerified email at psu.edu
Shabnam MonfaredSmiths DetectionVerified email at wesleyan.edu
José L. LópezProfessor of Physics, Seton Hall UniversityVerified email at shu.edu
Agasanapur, BasavarajuProcess Engineer, Intel CorporationVerified email at intel.com
Mehmet Remzi DokmeciAssociate Professor, Terasaki Institute for Biomedical InnovationVerified email at terasaki.org
David R. KaeliDistinguished Professor of ECE, Northeastern UniversityVerified email at ece.neu.edu
Timothy A, GrotjohnProfessor of Electrical and Computer Engineering, Michigan State UniversityVerified email at egr.msu.edu
Mak Peng UnUniversity of MacauVerified email at umac.mo
Alan HoskinsonPhysical Sciences Inc.
Dr. Pradeep Kumar SinghM M M University of Technology, GorakhpurVerified email at mmmut.ac.in
José Gregório

Jeffrey Hopwood

Professor of Electrical and Computer Engineering, Tufts University

Verified email at ece.tufts.edu - Homepage

Plasma Science Plasma Processing Plasma Semiconductor Processing Microplasma


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Review of inductively coupled plasmas for plasma processing J Hopwood Plasma Sources Science and Technology 1 (2), 109, 1992	894	1992
Metal ion deposition from ionized mangetron sputtering discharge SM Rossnagel, J Hopwood Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994	501	1994
Langmuir probe measurements of a radio frequency induction plasma J Hopwood, CR Guarnieri, SJ Whitehair, JJ Cuomo Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 11 (1 …, 1993	400	1993
Magnetron sputter deposition with high levels of metal ionization SM Rossnagel, J Hopwood Applied physics letters 63 (24), 3285-3287, 1993	381	1993
Electromagnetic fields in a radio‐frequency induction plasma J Hopwood, CR Guarnieri, SJ Whitehair, JJ Cuomo Journal Of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 11 (1 …, 1993	239	1993
Mechanisms for highly ionized magnetron sputtering J Hopwood, F Qian Journal of Applied Physics 78 (2), 758-765, 1995	209	1995
Radio frequency induction plasma processing system utilizing a uniform field coil JJ Cuomo, CR Guarnieri, JA Hopwood, SJ Whitehair US Patent 5,280,154, 1994	199	1994
Low-power microwave plasma source based on a microstrip split-ring resonator F Iza, JA Hopwood IEEE transactions on plasma science 31 (4), 782-787, 2003	198	2003
Ionized physical vapor deposition of integrated circuit interconnects J Hopwood Physics of Plasmas 5 (5), 1624-1631, 1998	177	1998
Split-ring resonator microplasma: microwave model, plasma impedance and power efficiency F Iza, J Hopwood Plasma Sources Science and Technology 14 (2), 397, 2005	173	2005
Miniaturization of inductively coupled plasma sources Y Yin, J Messier, JA Hopwood IEEE Transactions on plasma science 27 (5), 1516-1524, 1999	160	1999
Ion bombardment energy distributions in a radio frequency induction plasma J Hopwood Applied physics letters 62 (9), 940-942, 1993	159	1993
A microfabricated inductively coupled plasma generator JA Hopwood Journal of Microelectromechanical Systems 9 (3), 309-313, 2000	144	2000
Ionized physical vapor deposition J Hopwood, A Wendt, S Rossnagel, W Holber, KF Lai, J Forster, ... Academic Press 27, 253, 1999	138*	1999
Rotational, vibrational, and excitation temperatures of a microwave-frequency microplasma F Iza, JA Hopwood IEEE transactions on plasma science 32 (2), 498-504, 2004	130	2004
Planar RF induction plasma coupling efficiency J Hopwood Plasma Sources Science and Technology 3 (4), 460, 1994	110	1994
Charged particle densities and energy distributions in a multipolar electron cyclotron resonant plasma etching source J Hopwood, DK Reinhard, J Asmussen Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 8 (4 …, 1990	110	1990
A microfabricated atmospheric-pressure microplasma source operating in air J Hopwood, F Iza, S Coy, DB Fenner Journal of Physics D: Applied Physics 38 (11), 1698, 2005	106	2005
Optically pumped microplasma rare gas laser WT Rawlins, KL Galbally-Kinney, SJ Davis, AR Hoskinson, JA Hopwood, ... Optics express 23 (4), 4804-4813, 2015	98	2015
Microplasmas ignited and sustained by microwaves J Hopwood, AR Hoskinson, J Gregório Plasma Sources Science and Technology 23 (6), 064002, 2014	89	2014

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