| Supersonic metal cluster beams: laser photoionization studies of copper cluster (Cu2) DE Powers, SG Hansen, ME Geusic, AC Puiu, JB Hopkins, TG Dietz, ... The Journal of Physical Chemistry 86 (14), 2556-2560, 1982 | 377 | 1982 |
| Supersonic copper clusters DE Powers, SG Hansen, ME Geusic, DL Michalopoulos, RE Smalley The Journal of Chemical Physics 78 (6), 2866-2881, 1983 | 321 | 1983 |
| Formation of polymer films by pulsed laser evaporation SG Hansen, TE Robitaille Applied physics letters 52 (1), 81-83, 1988 | 211 | 1988 |
| The bond length of chromium dimer DL Michalopoulos, ME Geusic, SG Hansen, DE Powers, RE Smalley The Journal of Physical Chemistry 86 (20), 3914-3916, 1982 | 194 | 1982 |
| Outbreak of Salmonella Serotype Enteritidis Infections Associated with Raw Almonds--United States and Canada, 2003-2004. S Keady, G Briggs, J Farrar, JC Mohle-Boetani, J OConnell, SB Werner, ... MMWR: Morbidity & Mortality Weekly Report 53 (22), 2004 | 180 | 2004 |
| Lithographic apparatus and method for optimizing an illumination source using photolithographic simulations SG Hansen US Patent 7,030,966, 2006 | 104 | 2006 |
| Lithographic apparatus and method for optimizing illumination using a photolithographic simulation SG Hansen US Patent 7,245,356, 2007 | 102 | 2007 |
| SOURCE-MASK OPTIMIZATION IN LITHOGRAPHIC APPARATUS US Patent 8,786,824, 0 | 83* | |
| An innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging S Hsu, L Chen, Z Li, S Park, K Gronlund, H Liu, N Callan, R Socha, ... Lithography Asia 2008 7140, 220-229, 2008 | 81 | 2008 |
| Study of ultraviolet‐laser ablation products of several polymers using time‐of‐flight mass spectroscopy SG Hansen Journal of applied physics 66 (3), 1411-1422, 1989 | 74 | 1989 |
| EUV simulation extension study for mask shadowing effect and its correction H Kang, S Hansen, J van Schoot, K van Ingen Schenau Emerging Lithographic Technologies XII 6921, 978-988, 2008 | 73 | 2008 |
| EUV resolution enhancement techniques (RETs) for k1 0.4 and below S Hsu, R Howell, J Jia, HY Liu, K Gronlund, S Hansen, J Zimmermann Extreme Ultraviolet (EUV) Lithography VI 9422, 480-495, 2015 | 72 | 2015 |
| Polarization effects associated with hyper-numerical-aperture lithography D Flagello, B Geh, S Hansen, M Totzeck Journal of Micro/Nanolithography, MEMS and MOEMS 4 (3), 031104-031104-17, 2005 | 65 | 2005 |
| Velocity profiles of species ejected in ultraviolet laser ablation of several polymers examined by time‐of‐flight mass spectroscopy SG Hansen Journal of applied physics 66 (7), 3329-3336, 1989 | 65 | 1989 |
| Measurements of F*, CF, and CF2 formation and decay in pulsed fluorocarbon discharges SG Hansen, G Luckman, SD Colson Applied physics letters 53 (17), 1588-1590, 1988 | 57 | 1988 |
| EUV source-mask optimization for 7nm node and beyond X Liu, R Howell, S Hsu, K Yang, K Gronlund, F Driessen, HY Liu, ... Extreme Ultraviolet (EUV) Lithography V 9048, 171-181, 2014 | 53 | 2014 |
| Exposure with intensity balancing to mimic complex illuminator shape SG Hansen US Patent 7,180,576, 2007 | 48 | 2007 |
| Lithographic apparatus and method for optimizing an illumination source using isofocal compensation SG Hansen US Patent 7,016,017, 2006 | 48 | 2006 |
| Source mask optimization to reduce stochastic effects SG Hansen US Patent 9,213,783, 2015 | 44 | 2015 |
| Method for optimizing an illumination source using full resist simulation and process window response metric SG Hansen US Patent 6,839,125, 2005 | 44 | 2005 |
