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Timothy N. Walter
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Oxidation and oxidative vapor-phase etching of few-layer MoS2
TN Walter, F Kwok, H Simchi, HM Aldosari, SE Mohney
Journal of Vacuum Science & Technology B 35 (2), 2017
632017
Evaporated manganese films as a starting point for the preparation of thin-layer MnO x water-oxidation anodes
CE Frey, F Kwok, D Gonzáles-Flores, J Ohms, KA Cooley, H Dau, ...
Sustainable Energy & Fuels 1 (5), 1162-1170, 2017
302017
Sulfidation of 2D transition metals (Mo, W, Re, Nb, Ta): thermodynamics, processing, and characterization
H Simchi, TN Walter, TH Choudhury, LY Kirkley, JM Redwing, SE Mohney
Journal of Materials Science 52, 10127-10139, 2017
272017
Atomic layer deposition of ZnO on MoS2 and WSe2
TN Walter, S Lee, X Zhang, M Chubarov, JM Redwing, TN Jackson, ...
Applied Surface Science 480, 43-51, 2019
242019
Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
AJ Mughal, TN Walter, KA Cooley, A Bertuch, SE Mohney
Journal of Vacuum Science & Technology A 37 (1), 2019
242019
Molybdenum carbonitride deposited by plasma atomic layer deposition as a Schottky contact to gallium nitride
A Molina, IE Campbell, TN Walter, AD Agyapong, SE Mohney
Applied Physics Letters 119 (10), 2021
62021
Nickel diffusion into MoS2 and the effect of annealing on contact resistance
TN Walter, KA Cooley, AC Domask, SE Mohney
Materials Science in Semiconductor Processing 107, 104850, 2020
62020
First-principles study and experimental characterization of metal incorporation in germanium telluride
KA Cooley, N Keilbart, JG Champlain, LB Ruppalt, TN Walter, I Dabo, ...
Journal of Applied Physics 128 (22), 2020
42020
Electron beam evaporated Au islands as a nanoscale etch mask on few-layer MoS2 and fabrication of top-edge hybrid contacts for field-effect transistors
TN Walter, N Oliver, SE Mohney
Nanotechnology 32 (2), 025203, 2020
42020
Precision Wet Etching of ZnO Using Buffer Solutions
S Lee, TN Walter, S Noh, SE Mohney, TN Jackson
Journal of Microelectromechanical Systems 29 (6), 1504-1509, 2020
42020
Processing of Two-Dimensional Molybdenum Disulfide: Oxidation, Etching, and Deposition on the Basal Plane for Novel Nanofabrication Processes
TN Walter
The Pennsylvania State University, 2019
12019
High-temperature-capable ALD-based inorganic lift-off process
S Lee, TN Walter, SE Mohney, TN Jackson
Materials Science in Semiconductor Processing 130, 105809, 2021
2021
High Work Function Metallizations on Gallium Nitride for Schottky Diodes
A Molina, SP Dail, IE Campbell, TN Walter, MW Thomas, AJ Mughal, ...
Electrochemical Society Meeting Abstracts 239, 1072-1072, 2021
2021
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Articles 1–13