| Formation and catalytic activity of spherical composites with surfaces coated with gold nanoparticles X Chen, D Zhao, Y An, Y Zhang, J Cheng, B Wang, L Shi Journal of colloid and interface science 322 (2), 414-420, 2008 | 98 | 2008 |
| Core− shell− corona Au− micelle composites with a tunable smart hybrid shell X Chen, Y An, D Zhao, Z He, Y Zhang, J Cheng, L Shi Langmuir 24 (15), 8198-8204, 2008 | 67 | 2008 |
| PS-b-PHEMA: synthesis, characterization, and processing of a high χ polymer for directed self-assembly lithography J Cheng, RA Lawson, WM Yeh, ND Jarnagin, LM Tolbert, CL Henderson SPIE Advanced Lithography, 86801W-86801W-7, 2013 | 17 | 2013 |
| Developing directly photodefinable substrate guiding layers for block copolymer directed self-assembly (DSA) patterning J Cheng, RA Lawson, WM Yeh, LM Tolbert, CL Henderson SPIE Advanced Lithography, 79722I-79722I-13, 2011 | 15 | 2011 |
| PS-b-PHOST as a high χ block copolymers for directed self assembly: optimization of underlayer and solvent anneal processes ND Jarnagin, WM Yeh, J Cheng, A Peters, RA Lawson, LM Tolbert, ... SPIE Advanced Lithography, 86801X-86801X-10, 2013 | 11 | 2013 |
| Directed self-assembly of poly (styrene)-block-poly (acrylic acid) copolymers for sub-20nm pitch patterning J Cheng, RA Lawson, WM Yeh, ND Jarnagin, A Peters, LM Tolbert, ... SPIE Advanced Lithography, 83232R-83232R-8, 2012 | 10 | 2012 |
| Aqueous and solvent developed negative-tone molecular resists RA Lawson, J Cheng, DE Noga, TR Younkin, LM Tolbert, CL Henderson SPIE Advanced Lithography, 76390O-76390O-13, 2010 | 10 | 2010 |
| Non-traditional resist designs using molecular resists: positive tone cross-linked and non-chemically amplified molecular resists RA Lawson, DE Noga, J Cheng, LM Tolbert, CL Henderson SPIE Advanced Lithography, 76392F-76392F-13, 2010 | 10 | 2010 |
| Postiive tone resists based on network deploymerization of molecular resists RA Lawson, J Cheng, A Cheshmehkani, LM Tolbert, CL Henderson SPIE Advanced Lithography, 868221-868221-10, 2013 | 8 | 2013 |
| Investigation of high χ block copolymers for directed self-asssembly: synthesis and characterization of PS-b-PHOST ND Jarnagin, J Cheng, A Peters, WM Yeh, RA Lawson, LM Tolbert, ... SPIE Advanced Lithography, 832310-832310-9, 2012 | 7 | 2012 |
| PS-b-PAA as a high χ polymer for directed self-assembly: a study of solvent and thermal annealing processes for PS-b-PAA J Cheng, RA Lawson, WM Yeh, ND Jarnagin, LM Tolbert, CL Henderson SPIE Advanced Lithography, 86801V-86801V-4, 2013 | 3 | 2013 |
