| Line‐Profile resist development simulation techniques RE Jewett, PI Hagouel, AR Neureuther, T Van Duzer Polymer Engineering & Science 17 (6), 381-384, 1977 | 196 | 1977 |
| An efficient photoresist development simulator based on cellular automata with experimental verification I Karafyllidis, PI Hagouel, A Thanailakis, AR Neureuther IEEE transactions on semiconductor manufacturing 13 (1), 61-75, 2000 | 47 | 2000 |
| Quantum computers: Registers, gates and algorithms PI Hagouel, IG Karafyllidis 2012 28th International Conference on Microelectronics Proceedings, 15-21, 2012 | 22 | 2012 |
| X-ray lithographic fabrication of blazed diffraction gratings PI Hagouel University of California, Berkeley, 1976 | 20 | 1976 |
| Negative resist corner rounding. Envelope volume modeling PIL Hagouel, AR Neureuther, AM Zenk Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1996 | 19 | 1996 |
| Simulation of deposition-topography granular distortion for TCAD I Karafyllidis, N Georgoulas, PI Hagouel, A Thanailakis Modelling and Simulation in Materials Science and Engineering 6 (3), 199, 1998 | 16 | 1998 |
| Dependence of developed negative resist profiles on exposure energy dose: experiment, modeling, and simulation PI Hagouel, I Karafyllidis, AR Neureuther Microelectronic engineering 41, 351-354, 1998 | 15 | 1998 |
| Developer temperature effect on negative deep ultraviolet resists: Characterization, modeling, and simulation PI Hagouel, I Karafyllidis, AR Neureuther Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1997 | 15 | 1997 |
| Blazed diffraction gratings fabricated using X-ray lithography: fabrication, modeling and simulation PI Hagouel Microelectronics Reliability 43 (2), 249-258, 2003 | 14 | 2003 |
| Negative resist profiles in 248 nm photolithography: experiment, modelling and simulation I Karafyllidis, PI Hagouel, AR Neureuther Semiconductor science and technology 13 (6), 603, 1998 | 11 | 1998 |
| Polymer Eng RE Jewett, PI Hagouel, AR Neureuther, TV Duzer Sci 17 (6), 381, 1977 | 11 | 1977 |
| Modeling of X-ray resists for high-resolution lithography PI Hagouel, AR Neureuther ACS Organic Coating and Plastics Preprints 35 (2), 258-265, 1975 | 11 | 1975 |
| Negative resist profiles of close-spaced parallel and isolated lines: experiment, modelling and simulation I Karafyllidis, PI Hagouel, AR Neureuther Microelectronic engineering 45 (1), 71-84, 1999 | 10 | 1999 |
| Surface etching simulation and applications in IC processing AR Neureuther, RE Jewett, PI Hagouel, T Van Duzer Proc. Kodak Microelectronics Seminar, Interface'76, 81-91, 1976 | 9 | 1976 |
| Simulation of multiple etch fronts Y Karafyllidis, P Hagouel Microelectronics journal 22 (7-8), 97-104, 1991 | 7 | 1991 |
| Quantum mechanical tunnelling in nanoelectronic circuits: Design of a nanoelectronic single-electron RAM PI Hagouel, IG Karafyllidis 2010 27th International Conference on Microelectronics Proceedings, 21-28, 2010 | 5 | 2010 |
| X-ray lithographic fabrication of blazed diffraction gratings AR Neureuther, P Hagouel Proc. 6th Int. Conf. on Electron and Ion Beam Science and Technology, 1974 | 5 | 1974 |
| The History of the Jews of Thessaloniki and the Holocaust PI Hagouel | 4 | 2006 |
| Modeling and simulation of anisotropic etching N Tassopoulos, P Hagouel, E Kriezis Proceedings of the Microcircuit Engineering 83 Conference, Cambridge, 421-426, 1983 | 4 | 1983 |
| Nanoelectronic graphene devices PI Hagouel, IG Karafyllidis 2017 IEEE 30th International Conference on Microelectronics (MIEL), 63-66, 2017 | 3 | 2017 |
Ioannis KarafyllidisProfessor, Democritus University of ThraceVerified email at ee.duth.gr
Ioannis KarafyllidisProfessor, Democritus University of ThraceVerified email at ee.duth.gr