| Multi-spot investigation apparatus DJW Klunder, M Van Herpen, M Balistreri, C Liedenbaum, M Prins, ... US Patent App. 11/720,842, 2009 | 120 | 2009 |
| Wiregrid waveguide DJW Klunder, MMJW Van Herpen, MA Verschuuren US Patent App. 12/519,834, 2010 | 84 | 2010 |
| Continuous-wave operation of a single-frequency optical parametric oscillator at 4–5 μm based on periodically poled LiNbO3 M Van Herpen, SE Bisson, FJM Harren Optics Letters 28 (24), 2497-2499, 2003 | 76 | 2003 |
| Photoacoustic trace gas detection of ethane using a continuously tunable, continuous-wave optical parametric oscillator based on periodically poled lithium niobate M Van Herpen, S Li, SE Bisson, FJM Harren Applied Physics Letters 81 (7), 1157-1159, 2002 | 72 | 2002 |
| Tuning and stability of a continuous-wave mid-infrared high-power single resonant optical parametric oscillator M Van Herpen, S Li, SE Bisson, S te Lintel Hekkert, FJM Harren Applied Physics B 75, 329-333, 2002 | 71 | 2002 |
| Wide single-mode tuning of a 3.0–3.8-µm, 700-mW, continuous-wave Nd: YAG-pumped optical parametric oscillator based on periodically poled lithium niobate M Van Herpen, S te Lintel Hekkert, SE Bisson, FJM Harren Optics letters 27 (8), 640-642, 2002 | 70 | 2002 |
| Optical parametric oscillator-based photoacoustic detection of CO2 at 4.23 μm allows real-time monitoring of the respiration of small insects M Van Herpen, AKY Ngai, SE Bisson, JHP Hackstein, EJ Woltering, ... Applied Physics B 82, 665-669, 2006 | 62 | 2006 |
| Sn etching with hydrogen radicals to clean EUV optics M Van Herpen, DJW Klunder, WA Soer, R Moors, V Banine Chemical Physics Letters 484 (4-6), 197-199, 2010 | 57 | 2010 |
| Radical cleaning arrangement for a lithographic apparatus VY Banine, VV Ivanov, JHJ Moors, BT Wolschrijn, DJW Klunder, ... US Patent 7,462,850, 2008 | 55 | 2008 |
| Combined wide pump tuning and high power of a continuous-wave, singly resonant optical parametric oscillator M Van Herpen, SE Bisson, AKY Ngai, FJM Harren Applied Physics B 78, 281-286, 2004 | 49 | 2004 |
| Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby DJW Klunder, MMJW Van Herpen US Patent 7,453,645, 2008 | 38 | 2008 |
| Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources WA Soer, MJJ Jak, AM Yakunin, MMJW van Herpen, VY Banine Alternative Lithographic Technologies 7271, 774-782, 2009 | 35 | 2009 |
| Extreme ultraviolet multilayer mirror with near-zero IR reflectance WA Soer, P Gawlitza, M Van Herpen, MJJ Jak, S Braun, P Muys, ... Optics letters 34 (23), 3680-3682, 2009 | 33 | 2009 |
| Light guide, illumination system, backlighting system and display device F Pijlman, MMJW Van Herpen, M Van Baardwijk US Patent App. 13/392,889, 2012 | 32 | 2012 |
| Non-invasive glucose sensor MM Van Herpen, O Such, G Von Basum US Patent App. 12/297,235, 2009 | 31 | 2009 |
| Lithographic apparatus, illumination system and debris trapping system LP Bakker, DJW Klunder, MMJW Van Herpen US Patent 7,145,132, 2006 | 31 | 2006 |
| Glucose Sensor MMJW Van Herpen, MLM Balistreri, C Presura US Patent App. 11/914,976, 2008 | 30 | 2008 |
| Debris mitigation and cleaning strategies for Sn-based sources for EUV lithography DJW Klunder, M van Herpen, VY Banine, K Gielissen Emerging Lithographic Technologies IX 5751, 943-951, 2005 | 29 | 2005 |
| Spectral-purity-enhancing layer for multilayer mirrors M Van Herpen, RWE van de Kruijs, DJW Klunder, E Louis, AE Yakshin, ... Optics letters 33 (6), 560-562, 2008 | 25 | 2008 |
| Development of a powerful continuously tunable mid-infrared cw PPLN OPO for trace gas detection M van Herpen, S te Lintel Hekkert, SE Bisson, FJM Harren ALT'01 International Conference on Advanced Laser Technologies 4762, 16-21, 2002 | 25 | 2002 |
Matthew S. JohnsonProfessor, Department of Chemistry, University of CopenhagenVerified email at chem.ku.dk
