| Angle-resolved XPS analysis and characterization of monolayer and multilayer silane films for DNA coupling to silica RA Shircliff, P Stradins, H Moutinho, J Fennell, ML Ghirardi, SW Cowley, ... Langmuir 29 (12), 4057-4067, 2013 | 120 | 2013 |
| Comparison of pulsed and downstream deposition of fluorocarbon materials from and plasmas IT Martin, GS Malkov, CI Butoi, ER Fisher Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 22 (2 …, 2004 | 68 | 2004 |
| Controlled Nitrogen Doping and Film Colorimetrics in Porous TiO2 Materials Using Plasma Processing DJV Pulsipher, IT Martin, ER Fisher ACS applied materials & interfaces 2 (6), 1743-1753, 2010 | 64 | 2010 |
| On the importance of ions and ion-molecule reactions to plasma-surface interface reactions KL Williams, IT Martin, ER Fisher Journal of the American Society for Mass Spectrometry 13 (5), 518-529, 2002 | 58 | 2002 |
| Material quality requirements for efficient epitaxial film silicon solar cells K Alberi, IT Martin, M Shub, CW Teplin, MJ Romero, RC Reedy, ... Applied Physics Letters 96 (7), 2010 | 53 | 2010 |
| Investigation of inductively coupled Ar and CH4/Ar plasmas and the effect of ion energy on DLC film properties J Zhou, IT Martin, R Ayers, E Adams, D Liu, ER Fisher Plasma sources science and technology 15 (4), 714, 2006 | 53 | 2006 |
| Hot-wire chemical vapor deposition of epitaxial film crystal silicon for photovoltaics HM Branz, CW Teplin, MJ Romero, IT Martin, Q Wang, K Alberi, DL Young, ... Thin Solid Films 519 (14), 4545-4550, 2011 | 52 | 2011 |
| Ion effects on CF2 surface interactions during C3F8 and C4F8 plasma processing of Si IT Martin, ER Fisher Journal of Vacuum Science & Technology A 22 (5), 2168-2176, 2004 | 49 | 2004 |
| High-resolution X-ray photoelectron spectroscopy of mixed silane monolayers for DNA attachment RA Shircliff, IT Martin, JW Pankow, J Fennell, P Stradins, ML Ghirardi, ... ACS Applied Materials & Interfaces 3 (9), 3285-3292, 2011 | 39 | 2011 |
| Plasma modification of PDMS microfluidic devices for control of electroosmotic flow IT Martin, B Dressen, M Boggs, Y Liu, CS Henry, ER Fisher Plasma Processes and Polymers 4 (4), 414-424, 2007 | 39 | 2007 |
| Degradation of transparent conductive oxides: Interfacial engineering and mechanistic insights HM Mirletz, KA Peterson, IT Martin, RH French Solar Energy Materials and Solar Cells 143, 529-538, 2015 | 34 | 2015 |
| Pulsed‐plasma‐induced micropatterning with alternating hydrophilic and hydrophobic surface chemistries GS Malkov, IT Martin, WB Schwisow, JP Chandler, BT Wickes, LJ Gamble, ... Plasma Processes and Polymers 5 (2), 129-145, 2008 | 34 | 2008 |
| Radical-surface interactions during film deposition: A sticky situation? D Liu, IT Martin, J Zhou, ER Fisher Pure and applied chemistry 78 (6), 1187-1202, 2006 | 34 | 2006 |
| Mechanisms controlling the phase and dislocation density in epitaxial silicon films grown from silane below 800 C CW Teplin, K Alberi, M Shub, C Beall, IT Martin, MJ Romero, DL Young, ... Applied Physics Letters 96 (20), 2010 | 26 | 2010 |
| Local measurement of Janus particle cap thickness A Rashidi, MW Issa, IT Martin, A Avishai, S Razavi, CL Wirth ACS applied materials & interfaces 10 (37), 30925-30929, 2018 | 23 | 2018 |
| The effect of low frequency pulse-shaped substrate bias on the remote plasma deposition of a-Si: H thin films IT Martin, MA Wank, MA Blauw, R Van Swaaij, WMM Kessels, ... Plasma Sources Science and Technology 19 (1), 015012, 2009 | 23 | 2009 |
| Doping of high-quality epitaxial silicon grown by hot-wire chemical vapor deposition near 700° C IT Martin, HM Branz, P Stradins, DL Young, RC Reedy, CW Teplin Thin Solid Films 517 (12), 3496-3498, 2009 | 22 | 2009 |
| Correlating ion energies and CF2 surface production during fluorocarbon plasma processing of silicon IT Martin, J Zhou, ER Fisher Journal of applied physics 100 (1), 2006 | 22 | 2006 |
| Nanoscale measurements of local junction breakdown in epitaxial film silicon solar cells MJ Romero, K Alberi, IT Martin, KM Jones, DL Young, Y Yan, C Teplin, ... Applied Physics Letters 97 (9), 2010 | 17 | 2010 |
| Physics and chemistry of hot-wire chemical vapor deposition from silane: Measuring and modeling the silicon epitaxy deposition rate IT Martin, CW Teplin, JR Doyle, HM Branz, P Stradins Journal of Applied Physics 107 (5), 2010 | 16 | 2010 |
Howard M. BranzRenewable and Sustainable Energy Institute, University of Colorado - BoulderVerified email at colorado.edu
