| Modeling the patterned two‐dimensional electron gas: Electrostatics JH Davies, IA Larkin, EV Sukhorukov Journal of Applied Physics 77 (9), 4504-4512, 1995 | 258* | 1995 |
| Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography P Ruchhoeft, M Colburn, B Choi, H Nounu, S Johnson, T Bailey, S Damle, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1999 | 212 | 1999 |
| Use of Tricrystal Junctions to Probe the Pairing State Symmetry of YBCO JH Miller Jr, QY Ying, ZG Zou, NQ Fan, JH Xu, MF Davis, JC Wolfe Physical review letters 74 (12), 2347, 1995 | 155 | 1995 |
| Monolithic NPG nanoparticles with large surface area, tunable plasmonics, and high-density internal hot-spots F Zhao, J Zeng, MMP Arnob, P Sun, J Qi, P Motwani, M Gheewala, CH Li, ... Nanoscale 6 (14), 8199-8207, 2014 | 136 | 2014 |
| Surface-enhanced Raman spectroscopy with monolithic nanoporous gold disk substrates J Qi, P Motwani, M Gheewala, C Brennan, JC Wolfe, WC Shih Nanoscale 5 (10), 4105-4109, 2013 | 123 | 2013 |
| Ion assisted deposition process including reactive source gassification JC Wolfe, WS Ho, DL Licon, YL Chau US Patent 5,415,756, 1995 | 76 | 1995 |
| Fabrication of a high anisotropy nanoscale patterned magnetic recording medium for data storage applications V Parekh, E Chunsheng, D Smith, A Ruiz, JC Wolfe, P Ruchhoeft, ... Nanotechnology 17 (9), 2079, 2006 | 66 | 2006 |
| Deposition of high quality YBa2Cu3O7−δ thin films over large areas by pulsed laser ablation with substrate scanning MF Davis, J Wosik, K Forster, SC Deshmukh, HR Rampersad, S Shah, ... Journal of applied physics 69 (10), 7182-7188, 1991 | 64 | 1991 |
| Direct‐current‐magnetron deposition of molybdenum and tungsten with rf‐substrate bias A Bensaoula, JC Wolfe, A Ignatiev, FO Fong, TS Leung Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 2 (2 …, 1984 | 48 | 1984 |
| Application of optical filters fabricated by masked ion beam lithography MD Morgan, WE Horne, V Sundaram, JC Wolfe, SV Pendharkar, R Tiberio Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1996 | 47 | 1996 |
| Effect of target temperature on the reactive dc-sputtering of silicon and niobium oxides RY Chau, WS Ho, JC Wolfe, DL Licon Thin Solid Films 287 (1-2), 57-64, 1996 | 46 | 1996 |
| Ion beam aperture-array lithography P Ruchhoeft, JC Wolfe, R Bass Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2001 | 45 | 2001 |
| Persistent photoconductivity in insulating and superconducting thin films: Temperature and spectral dependence SL Bud’ko, HH Feng, MF Davis, JC Wolfe, PH Hor Physical Review B 48 (22), 16707, 1993 | 45 | 1993 |
| Template mask lithography utilizing structured beam JC Wolfe, P Ruchhoeft US Patent 6,372,391, 2002 | 42 | 2002 |
| Novel electrostatic column for ion projection lithography A Chalupka, G Stengl, H Buschbeck, G Lammer, H Vonach, R Fischer, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994 | 42 | 1994 |
| A proximity ion beam lithography process for high density nanostructures JC Wolfe, SV Pendharkar, P Ruchhoeft, S Sen, MD Morgan, WE Horne, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1996 | 40 | 1996 |
| High‐resolution pattern definition in tungsten JN Randall, JC Wolfe Applied Physics Letters 39 (9), 742-743, 1981 | 38 | 1981 |
| Neutral particle lithography: a simple solution to charge-related artefacts in ion beam proximity printing JC Wolfe, BP Craver Journal of Physics D: Applied Physics 41 (2), 024007, 2008 | 36 | 2008 |
| Large-field ion optics for projection and proximity printing and for maskless lithography (ML2) H Loeschner, G Stengl, H Buschbeck, A Chalupka, G Lammer, ... Emerging Lithographic Technologies VI 4688, 595-606, 2002 | 36 | 2002 |
| Ion projection lithography: International development program R Kaesmaier, H Löschner, G Stengl, JC Wolfe, P Ruchhoeft Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1999 | 36 | 1999 |
