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Mahdi Shirazi
Mahdi Shirazi
ICT developer and analyst computational chemistry, UvA
Verified email at uva.nl - Homepage
Title
Cited by
Cited by
Year
Atomistic kinetic Monte Carlo study of atomic layer deposition derived from density functional theory
M Shirazi, SD Elliott
Journal of computational chemistry 35 (3), 244-259, 2014
912014
Cooperation between adsorbates accounts for the activation of atomic layer deposition reactions
M Shirazi, SD Elliott
Nanoscale 7 (14), 6311-6318, 2015
692015
Edge-site nano-engineering of WS2 by low temperature plasma-enhanced atomic layer deposition for electrocatalytic hydrogen evolution
S Balasubramanyam, M Shirazi, MA Bloodgood, L Wu, MA Verheijen, ...
Chemistry of Materials, 2019
682019
DFT study of Ni-catalyzed plasma dry reforming of methane
M Shirazi, EC Neyts, A Bogaerts
Applied Catalysis B: Environmental 205, 605-614, 2017
662017
Multiple proton diffusion and film densification in atomic layer deposition modeled by density functional theory
M Shirazi, SD Elliott
Chemistry of Materials 25 (6), 878-889, 2013
612013
A DFT study of H-dissolution into the bulk of a crystalline Ni (111) surface: a chemical identifier for the reaction kinetics
M Shirazi, A Bogaerts, EC Neyts
Physical Chemistry Chemical Physics 19 (29), 19150-19158, 2017
352017
TEMAZ/O3 atomic layer deposition process with doubled growth rate and optimized interface properties in metal–insulator–metal capacitors
W Weinreich, T Tauchnitz, P Polakowski, M Drescher, S Riedel, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 31 (1 …, 2013
312013
Kinetic Monte Carlo Study of the Atomic Layer Deposition of Zinc Oxide
T Weckman, M Shirazi, SD Elliott, KE Laasonen
The Journal of Physical Chemistry C, 2018
262018
Initial stage of atomic layer deposition of 2D-MoS 2 on SiO 2 surface: a DFT study
M Shirazi, W Kessels, AA Bol
Physical Chemistry Chemical Physics, 2018
222018
Strategies to facilitate the formation of free standing MoS2 nanolayers on SiO2 surface by atomic layer deposition: A DFT study
M Shirazi, WMM Kessels, AA Bol
APL Materials 6 (11), 111107, 2018
132018
A Secondary Reaction Pathway for the Alumina Atomic Layer Deposition Process with Trimethylaluminum and Water, Revealed by Full-Range, Time-Resolved In Situ Mass Spectrometry
A Werbrouck, M Shirazi, F Mattelaer, SD Elliott, J Dendooven, ...
The Journal of Physical Chemistry C, 2020
72020
Cooperation between adsorbates accounts for the activation of atomic
M Shirazi, SD Elliott
2015
Multi-scale modelling of atomic layer deposition
M Shirazi
University College Cork, 2014
2014
Development of a DFT-based KMC model for Ni-catalyzed plasma dry reforming
M Shirazi, EC Neyts, A Bogaerts
Initial stage of atomic layer deposition of 2D-MoS2 on a SiO2 surface
M Shirazi, WMM Kessels, AA Bol
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