| Aluminum porphyrins with quaternary ammonium halides as catalysts for copolymerization of cyclohexene oxide and CO 2: metal–ligand cooperative catalysis J Deng, M Ratanasak, Y Sako, H Tokuda, C Maeda, J Hasegawa, ... Chemical science 11 (22), 5669-5675, 2020 | 59 | 2020 |
| Alternating Copolymerization of CO2 and Cyclohexene Oxide Catalyzed by Cobalt–Lanthanide Mixed Multinuclear Complexes H Asaba, T Iwasaki, M Hatazawa, J Deng, H Nagae, K Mashima, K Nozaki Inorganic Chemistry 59 (12), 7928-7933, 2020 | 46 | 2020 |
| Cationic co–salphen complexes bisligated by DMAP as catalysts for the copolymerization of cyclohexene oxide with phthalic anhydride or carbon dioxide M Hatazawa, R Takahashi, J Deng, H Houjou, K Nozaki Macromolecules 50 (20), 7895-7900, 2017 | 34 | 2017 |
| High-performance chain scissionable resists for extreme ultraviolet lithography: Discovery of the photoacid generator structure and mechanism J Deng, S Bailey, S Jiang, CK Ober Chemistry of Materials 34 (13), 6170-6181, 2022 | 18 | 2022 |
| Review of essential use of fluorochemicals in lithographic patterning and semiconductor processing CK Ober, F Käfer, J Deng Journal of Micro/Nanopatterning, Materials, and Metrology 21 (1), 010901-010901, 2022 | 18 | 2022 |
| Modular synthesis of phthalaldehyde derivatives enabling access to photoacid generator-bound self-immolative polymer resists with next-generation photolithographic properties J Deng, S Bailey, S Jiang, CK Ober Journal of the American Chemical Society 144 (42), 19508-19520, 2022 | 17 | 2022 |
| Synthesis of end-cap enabled self-immolative photoresists for extreme ultraviolet lithography J Deng, S Bailey, R Ai, A Delmonico, G Denbeaux, S Jiang, CK Ober ACS Macro Letters 11 (9), 1049-1054, 2022 | 10 | 2022 |
| New Approaches to EUV Photoresists: Studies of Polyacetals and Polypeptoids to Expand the Photopolymer Toolbox J Deng, F Kaefer, S Bailey, Y Otsubo, Z Meng, R Segalman, CK Ober Journal of photopolymer science and technology 34 (1), 71-74, 2021 | 8 | 2021 |
| Scissionable polymer photoresist for EUV lithography J Deng, S Bailey, CK Ober Advances in Patterning Materials and Processes XXXIX 12055, 132-138, 2022 | 3 | 2022 |
| Chain Scissionable Resists Based on Poly (acetal) Motif for Extreme Ultraviolet Lithography J Deng | | 2022 |
Christopher OberProfessor of Materials Science & Engineering, Cornell University or Xerox or UMASS Amherst or確認したメール アドレス: cornell.edu
