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Co-authors
- Oscar O. VersolatoGroup leader and Head of Department, Advanced Research Center for Nanolithography (ARCNL)Verified email at arcnl.nl
- WMG UbachsProfessor of Physics, VU AmsterdamVerified email at vu.nl
- Ronnie HoekstraZernike Institute for Advanced Materials, University of GroningenVerified email at rug.nl
- Ruben SchuppARCNLVerified email at arcnl.nl
- John SheilVerified email at arcnl.nl
- Zoi BouzaPhDVerified email at arcnl.nl
- Francesco TorrettiPhD student, Advanced Research Center for NanolithographyVerified email at arcnl.nl
- Stefan WitteAssociate professor at Vrije Universiteit Amsterdam, group leader at ARCNLVerified email at vu.nl
- Fei Liu (刘飞) ORCID: 0000-0003-412...ASMLVerified email at ucdavis.edu
- Guus RijndersProfessor Nano Electronic MaterialsVerified email at utwente.nl
- Randy A. MeijerAdvanced Research Center for NanolithographyVerified email at arcnl.nl
- Meric OzcanVerified email at sabanciuniv.edu
- Klaus-Jochen BollerUniversity of TwenteVerified email at utwente.nl
- Zeudi MazzottaASML, Veldhoven, The NetherlandsVerified email at asml.com
- Kjeld S. E. EikemaVU University Amsterdam, LaserLaB, De Boelelaan 1081, 1081 HV Amsterdam, The NetherlandsVerified email at vu.nl
- Dmitry KurilovichASMLVerified email at asml.com
- Yahia MostafaARCNLVerified email at arcnl.nl
- James ColganLos Alamos National LaboratoryVerified email at lanl.gov
- Mohammadreza NematollahiInstitute of Molecules and Materials, Radboud UniversityVerified email at science.ru.nl
- Chintan ShahNASA Goddard Space Flight CenterVerified email at nasa.gov
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