| Handbook of silicon semiconductor metrology AC Diebold CRC Press, 2001 | 164 | 2001 |
| Development of the metrology and imaging of cellulose nanocrystals MT Postek, A Vladár, J Dagata, N Farkas, B Ming, R Wagner, A Raman, ... Measurement Science and Technology 22 (2), 024005, 2010 | 115 | 2010 |
| Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist D Winston, BM Cord, B Ming, DC Bell, WF DiNatale, LA Stern, AE Vladar, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009 | 105 | 2009 |
| Determination of optimal parameters for CD-SEM measurement of line-edge roughness BD Bunday, M Bishop, DW McCormack Jr, JS Villarrubia, AE Vladar, ... Metrology, Inspection, and Process Control for Microlithography XVIII 5375 …, 2004 | 98 | 2004 |
| Scanning electron microscope analog of scatterometry JS Villarrubia, AE Vladar, JR Lowney, MT Postek Jr Metrology, Inspection, and Process Control for Microlithography XVI 4689 …, 2002 | 93 | 2002 |
| Scanning electron microscope analog of scatterometry JS Villarrubia, AE Vladar, JR Lowney, MT Postek Jr Metrology, Inspection, and Process Control for Microlithography XVI 4689 …, 2002 | 93 | 2002 |
| In-line E-beam wafer metrology and defect inspection: the end of an era for image-based critical dimensional metrology? New life for defect inspection E Solecky, OD Patterson, A Stamper, E McLellan, R Buengener, A Vaid, ... Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013 | 88 | 2013 |
| Scanning electron microscope dimensional metrology using a model‐based library JS Villarrubia, AE Vladár, MT Postek Surface and Interface Analysis: An International Journal devoted to the …, 2005 | 81 | 2005 |
| Silicon nanostructures fabricated by scanning probe oxidation and tetra-methyl ammonium hydroxide etching FSS Chien, WF Hsieh, S Gwo, AE Vladar, JA Dagata Journal of Applied Physics 91 (12), 10044-10050, 2002 | 77 | 2002 |
| Simulation study of repeatability and bias in the CD-SEM JS Villarrubia, AE Vladar, MT Postek Metrology, Inspection, and Process Control for Microlithography XVII 5038 …, 2003 | 70 | 2003 |
| Simulation study of repeatability and bias in the CD-SEM JS Villarrubia, AE Vladar, MT Postek Metrology, Inspection, and Process Control for Microlithography XVII 5038 …, 2003 | 70 | 2003 |
| Simulation study of repeatability and bias in the CD-SEM JS Villarrubia, AE Vladar, MT Postek Metrology, Inspection, and Process Control for Microlithography XVII 5038 …, 2003 | 70 | 2003 |
| Image sharpness measurement in the scanning electron microscope—Part III NF Zhang, MT Postek, RD Larrabee, AE Vladár, WJ Keery, SN Jones Scanning 21 (4), 246-252, 1999 | 70 | 1999 |
| Scanning electron microscope measurement of width and shape of 10 nm patterned lines using a JMONSEL-modeled library JS Villarrubia, AE Vladár, B Ming, RJ Kline, DF Sunday, JS Chawla, S List Ultramicroscopy 154, 15-28, 2015 | 68 | 2015 |
| Nanostructure fabrication by ultra-high-resolution environmental scanning electron microscopy M Toth, CJ Lobo, WR Knowles, MR Phillips, MT Postek, AE Vladár Nano letters 7 (2), 525-530, 2007 | 68 | 2007 |
| A tumor-targeted nanodelivery system to improve early MRI detection of cancer KF Pirollo, J Dagata, P Wang, M Freedman, A Vladar, S Fricke, L Ileva, ... Molecular imaging 5 (1), 7290.2006. 00005, 2006 | 66 | 2006 |
| A kurtosis-based statistical measure for two-dimensional processes and its applications to image sharpness NF Zhang, A Vladar, MT Postek, RD Larrabee Proceedings of the 2003 Section on Physical and Engineering Sciences, 2003 | 64 | 2003 |
| Particle size distributions by transmission electron microscopy: an interlaboratory comparison case study SB Rice, C Chan, SC Brown, P Eschbach, L Han, DS Ensor, AB Stefaniak, ... Metrologia 50 (6), 663, 2013 | 62 | 2013 |
| CD-SEM measurement line-edge roughness test patterns for 193-nm lithography BD Bunday, M Bishop, JS Villarrubia, AE Vladar Metrology, Inspection, and Process Control for Microlithography XVII 5038 …, 2003 | 58 | 2003 |
| CD-SEM measurement line-edge roughness test patterns for 193-nm lithography BD Bunday, M Bishop, JS Villarrubia, AE Vladar Metrology, Inspection, and Process Control for Microlithography XVII 5038 …, 2003 | 58 | 2003 |
