| Understanding chemical and physical mechanisms in atomic layer deposition NE Richey, C De Paula, SF Bent The Journal of chemical physics 152 (4), 2020 | 197 | 2020 |
| Universal length dependence of rod-to-seed exciton localization efficiency in type I and quasi-type II CdSe@ CdS nanorods K Wu, LJ Hill, J Chen, JR McBride, NG Pavlopolous, NE Richey, J Pyun, ... Acs Nano 9 (4), 4591-4599, 2015 | 113 | 2015 |
| Directing the deposition of ferromagnetic cobalt onto Pt-tipped CdSe@ CdS nanorods: synthetic and mechanistic insights LJ Hill, MM Bull, Y Sung, AG Simmonds, PT Dirlam, NE Richey, ... ACS nano 6 (10), 8632-8645, 2012 | 82 | 2012 |
| Colloidal polymers from dipolar assembly of cobalt-tipped CdSe@ CdS nanorods LJ Hill, NE Richey, Y Sung, PT Dirlam, JJ Griebel, E Lavoie-Higgins, ... ACS nano 8 (4), 3272-3284, 2014 | 48 | 2014 |
| Role of precursor choice on area-selective atomic layer deposition IK Oh, TE Sandoval, TL Liu, NE Richey, SF Bent Chemistry of Materials 33 (11), 3926-3935, 2021 | 37 | 2021 |
| Mechanistic study of nucleation enhancement in atomic layer deposition by pretreatment with small organometallic molecules C de Paula, NE Richey, L Zeng, SF Bent Chemistry of Materials 32 (1), 315-325, 2019 | 37 | 2019 |
| Modified atomic layer deposition of MoS2 thin films L Zeng, NE Richey, DW Palm, IK Oh, J Shi, C Maclsaac, T Jaramillo, ... Journal of Vacuum Science & Technology A 38 (6), 2020 | 22 | 2020 |
| N, N-Disubstituted-N′-acylthioureas as modular ligands for deposition of transition metal sulfides Z Ali, NE Richey, DC Bock, KA Abboud, J Akhtar, M Sher, ... Dalton transactions 47 (8), 2719-2726, 2018 | 22 | 2018 |
| Aerosol-assisted chemical vapor deposition of WS 2 from the single source precursor WS (S 2)(S 2 CNEt 2) 2 NE Richey, C Haines, JL Tami, L McElwee-White Chemical Communications 53 (55), 7728-7731, 2017 | 18 | 2017 |
| Synthesis of ferromagnetic cobalt nanoparticle tipped CdSe@ CdS nanorods: critical role of Pt-activation LJ Hill, NE Richey, Y Sung, PT Dirlam, JJ Griebel, IB Shim, N Pinna, ... CrystEngComm 16 (40), 9461-9468, 2014 | 18 | 2014 |
| Molecular layer deposition of a hafnium-based hybrid thin film as an electron beam resist J Shi, A Ravi, NE Richey, H Gong, SF Bent ACS Applied Materials & Interfaces 14 (23), 27140-27148, 2022 | 17 | 2022 |
| Surface plasmon-mediated chemical solution deposition of Cu nanoparticle films J Qiu, NE Richey, JS DuChene, Y Zhai, Y Zhang, L McElwee-White, ... The Journal of Physical Chemistry C 120 (37), 20775-20780, 2016 | 12 | 2016 |
| Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al2O3 with a Series of Al(CH3)xCl3–x and Al(CyH2y+1)3 Precursors IK Oh, TE Sandoval, TL Liu, NE Richey, CT Nguyen, B Gu, HBR Lee, ... Journal of the American Chemical Society 144 (26), 11757-11766, 2022 | 10 | 2022 |
| Synthesis and Characterization of Tungsten Nitrido Amido Guanidinato Complexes as Precursors for Chemical Vapor Deposition of WNxCy Thin Films MM Nolan, AJ Touchton, NE Richey, I Ghiviriga, JR Rocca, KA Abboud, ... European journal of inorganic chemistry 2018 (1), 46-53, 2018 | 8 | 2018 |
| Understanding and Utilizing Reactive Oxygen Reservoirs in Atomic Layer Deposition of Metal Oxides with Ozone JR Schneider, C de Paula, NE Richey, JG Baker, ST Oyakhire, SF Bent Chemistry of Materials 34 (12), 5584-5597, 2022 | 6 | 2022 |
| Multi-metal coordination polymers grown through hybrid molecular layer deposition NE Richey, S Borhan, SF Bent Dalton Transactions 50 (13), 4577-4582, 2021 | 6 | 2021 |
| Molecular Layer Deposition of Organic–Inorganic Hafnium Oxynitride Hybrid Films for Electrochemical Applications H Ablat, IK Oh, NE Richey, ST Oyakhire, Y Yang, W Zhang, W Huang, ... ACS Applied Energy Materials 6 (11), 5806-5816, 2023 | 2 | 2023 |
| Methyl-methacrylate based aluminum hybrid film grown via three-precursor molecular layer deposition ST Oyakhire, H Ablat, NE Richey, SF Bent Journal of Vacuum Science & Technology A 40 (2), 2022 | 2 | 2022 |
| Aerosol-Assisted Chemical Vapor Deposition of 2H-WS 2 From Single-Source Tungsten Dithiolene Precursors IM Germaine, NE Richey, MB Huttel, L McElwee-White Journal of Materials Chemistry C, 2024 | 1 | 2024 |
| Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al₂O₃ with a Series of Al (CH₃) ₓCl₃–ₓ and Al (CyH₂y₊ ₁) ₃ Precursors IK Oh, TE Sandoval, TL Liu, NE Richey, CT Nguyen, B Gu, R Tonner-Zech, ... | | 2022 |
