| Amperometric detection of morphine based on poly (3, 4-ethylenedioxythiophene) immobilized molecularly imprinted polymer particles prepared by precipitation polymerization KC Ho, WM Yeh, TS Tung, JY Liao Analytica chimica acta 542 (1), 90-96, 2005 | 170 | 2005 |
| Amperometric morphine sensing using a molecularly imprinted polymer-modified electrode WM Yeh, KC Ho Analytica chimica acta 542 (1), 76-82, 2005 | 122 | 2005 |
| A microfluidic system utilizing molecularly imprinted polymer films for amperometric detection of morphine CH Weng, WM Yeh, KC Ho, GB Lee Sensors and Actuators B: Chemical 121 (2), 576-582, 2007 | 118 | 2007 |
| Comparison of positive tone versus negative tone resist pattern collapse behaviora) WM Yeh, DE Noga, RA Lawson, LM Tolbert, CL Henderson Journal of Vacuum Science & Technology B 28 (6), C6S6-C6S11, 2010 | 44 | 2010 |
| A study of reactive adhesion promoters and their ability to mitigate pattern collapse in thin film lithography WM Yeh, RA Lawson, LM Tolbert, CL Henderson SPIE Advanced Lithography, 79721W-79721W-7, 2011 | 19 | 2011 |
| PS-b-PHEMA: synthesis, characterization, and processing of a high χ polymer for directed self-assembly lithography J Cheng, RA Lawson, WM Yeh, ND Jarnagin, LM Tolbert, CL Henderson SPIE Advanced Lithography, 86801W-86801W-7, 2013 | 17 | 2013 |
| Developing directly photodefinable substrate guiding layers for block copolymer directed self-assembly (DSA) patterning J Cheng, RA Lawson, WM Yeh, LM Tolbert, CL Henderson SPIE Advanced Lithography, 79722I-79722I-13, 2011 | 15 | 2011 |
| Methods to explore and prevent pattern collapse in thin film lithography DE Noga, WM Yeh, RA Lawson, LM Tolbert, CL Henderson SPIE Advanced Lithography, 76392O-76392O-6, 2010 | 15 | 2010 |
| PS-b-PHOST as a high χ block copolymers for directed self assembly: optimization of underlayer and solvent anneal processes ND Jarnagin, WM Yeh, J Cheng, A Peters, RA Lawson, LM Tolbert, ... SPIE Advanced Lithography, 86801X-86801X-10, 2013 | 11 | 2013 |
| Directed self-assembly of poly (styrene)-block-poly (acrylic acid) copolymers for sub-20nm pitch patterning J Cheng, RA Lawson, WM Yeh, ND Jarnagin, A Peters, LM Tolbert, ... SPIE Advanced Lithography, 83232R-83232R-8, 2012 | 10 | 2012 |
| Bond contribution model for the prediction of glass transition temperature in polyphenol molecular glass resists RA Lawson, WM Yeh, CL Henderson Journal of Vacuum Science & Technology B 27 (6), 3004-3009, 2009 | 9 | 2009 |
| A comprehensive model and method for model parameterization for predicting pattern collapse behavior in photoresist nanostructures WM Yeh, RA Lawson, CL Henderson SPIE Advanced Lithography, 79721X-79721X-10, 2011 | 8 | 2011 |
| Thin film buckling as a method to explore the effect of reactive rinse treatments on the mechanical properties of resist thin films WM Yeh, DE Noga, RA Lawson, LM Tolbert, CL Henderson SPIE Advanced Lithography, 76391I-76391I-6, 2010 | 8 | 2010 |
| Investigation of high χ block copolymers for directed self-asssembly: synthesis and characterization of PS-b-PHOST ND Jarnagin, J Cheng, A Peters, WM Yeh, RA Lawson, LM Tolbert, ... SPIE Advanced Lithography, 832310-832310-9, 2012 | 7 | 2012 |
| Pattern collapse in lithographic nanostructures: quantifying photoresist nanostructure behavior and novel methods for collapse mitigation WM Yeh Georgia Institute of Technology, 2013 | 5 | 2013 |
| The use of surface modifiers to mitigate pattern collapse in thin film lithography DE Noga, WM Yeh, RA Lawson, LM Tolbert, CL Henderson SPIE Advanced Lithography, 76391H-76391H-6, 2010 | 4 | 2010 |
| PS-b-PAA as a high χ polymer for directed self-assembly: a study of solvent and thermal annealing processes for PS-b-PAA J Cheng, RA Lawson, WM Yeh, ND Jarnagin, LM Tolbert, CL Henderson SPIE Advanced Lithography, 86801V-86801V-4, 2013 | 3 | 2013 |
| Application of aziridine reactive rinses in a post-development process to reduce photoresist pattern collapse WM Yeh, RA Lawson, LM Tolbert, CL Henderson SPIE Advanced Lithography, 83251Y-83251Y-7, 2012 | 3 | 2012 |
| Resist surface crosslinking using amine-based reactive rinses to mitagate pattern collapse in thin film lithography WM Yeh, RA Lawson, LM Tolbert, CL Henderson SPIE Advanced Lithography, 83251X-83251X-7, 2012 | 3 | 2012 |
| The effect of drying rate on pattern collapse performance in thin film lithography WM Yeh, RA Lawson, LM Tolbert, CL Henderson SPIE Advanced Lithography, 79721Y-79721Y-8, 2011 | 1 | 2011 |
