| Surprising effects of hydrochloric acid on the water evaporation coefficient observed by Raman thermometry AM Rizzuto, ES Cheng, RK Lam, RJ Saykally The Journal of Physical Chemistry C 121 (8), 4420-4425, 2017 | 34 | 2017 |
| Dissociative chemisorption of methyl fluoride and its implications for atomic layer etching of silicon nitride E Cheng, GS Hwang Applied Surface Science 543, 148557, 2021 | 12 | 2021 |
| Theoretical analysis of thermal spikes during ion bombardment of amorphous silicon nitride surfaces ES Cheng, PLG Ventzek, GS Hwang Journal of Vacuum Science & Technology A 41 (4), 2023 | 3 | 2023 |
| A density functional tight-binding based strategy for modeling ion bombardment and its application to Ar bombardment of silicon nitride ES Cheng, PLG Ventzek, GS Hwang Journal of Applied Physics 135 (9), 2024 | 1 | 2024 |
| Ammonium chloride (–NH3+ Cl-) salt formation from dichlorosilane decomposition and its potential impact on silicon nitride atomic layer deposition TH Yang, ES Cheng, SM Johnson, T Iwao, J Zhao, JG Ekerdt, ... Applied Surface Science 629, 157432, 2023 | 1 | 2023 |
| Low-energy argon ion bombardment-induced decomposition of physisorbed hydrofluorocarbons on silicon nitride surfaces: A computational mechanistic study ES Cheng, GS Hwang The Journal of Chemical Physics 159 (1), 2023 | 1 | 2023 |
| Silicon Nitride Surface Modification by Ion Bombardment with Physisorbed Hydrofluorocarbons: Theoretical Assessment ES Cheng, GS Hwang The Journal of Physical Chemistry C 127 (49), 23654-23663, 2023 | | 2023 |
| Anodization As A Low Cost Scalable and Tunable Nanoscale Manufacturing Technique. E Cheng Sandia National Lab.(SNL-NM), Albuquerque, NM (United States), 2016 | | 2016 |
| ALD/ALE 2021 Session ALE12: Atomic Layer Etching Poster Session E Cheng, G Hwang, Z Ventzek, Peter, Chen | | |
Richard J. SAYKALLYProfessor of Chemistry, UC BerkeleyVerified email at berkeley.edu
