| Tailoring turbulence with an active grid HE Cekli, W van de Water Experiments in fluids 49, 409-416, 2010 | 54 | 2010 |
| Resonant enhancement of turbulent energy dissipation HE Cekli, C Tipton, W van de Water Physical review letters 105 (4), 044503, 2010 | 40 | 2010 |
| Data enhancement, smoothing, reconstruction and optimization by kriging interpolation H Gunes, HE Cekli, U Rist 2008 Winter Simulation Conference, 379-386, 2008 | 20 | 2008 |
| Lithographic method PAJ Tinnemans, EM Hulsebos, HJL Megens, S Raghunathan, ... US Patent 10,527,958, 2020 | 12 | 2020 |
| Stirring turbulence with turbulence HE Cekli, R Joosten, W van de Water Physics of Fluids 27 (12), 2015 | 12 | 2015 |
| Metrology method and apparatus, computer program and lithographic system XL Liu, HJH Smilde, YL Peng, HE Cekli, J Pello, RJF Van Haren US Patent 9,879,988, 2018 | 11 | 2018 |
| Co-optimization of RegC and TWINSCAN corrections to improve the intra-field on-product overlay performance K Gorhad, O Sharoni, V Dmitriev, A Cohen, R van Haren, C Roelofs, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 11 | 2016 |
| Intra-field on-product overlay improvement by application of RegC and TWINSCAN corrections O Sharoni, V Dmitriev, E Graitzer, Y Perets, K Gorhad, R van Haren, ... Metrology, Inspection, and Process Control for Microlithography XXIX 9424 …, 2015 | 10 | 2015 |
| Lithographic apparatus and device manufacturing method FGC Bijnen, AJ Den Boef, RJF Van Haren, PAJ Tinnemans, A Ypma, ... US Patent 10,474,045, 2019 | 9 | 2019 |
| Method of obtaining measurements, apparatus for performing a process step, and metrology apparatus HE Cekli, M Ishibashi, WJM VAN DE VEN, WSC Roelofs, EG McNAMARA, ... US Patent 11,175,591, 2021 | 8 | 2021 |
| Deformation pattern recognition method, pattern transferring method, processing device monitoring method, and lithographic apparatus HE Cekli, I Lyulina, MG Tenner, RJF Van Haren, SCT Van Der Sanden US Patent 9,753,377, 2017 | 8 | 2017 |
| Spatial resolution Enhancement and reconstruction of mixed convection data using Kriging method HE Cekli, H Gunes ASME International Mechanical Engineering Congress and Exposition 47861, 447-456, 2006 | 7 | 2006 |
| A novel patterning control strategy based on real-time fingerprint recognition and adaptive wafer level scanner optimization HE Cekli, J Nije, A Ypma, V Bastani, D Sonntag, H Niesing, L Zhang, ... Metrology, Inspection, and Process Control for Microlithography XXXII 10585 …, 2018 | 6 | 2018 |
| Impact of reticle writing errors on the on-product overlay performance R Van Haren, HE Cekli, XL Liu, J Beltman, A Pastol, J Massin, ED La Tour, ... Photomask Technology 2014 9235, 514-522, 2014 | 6 | 2014 |
| Method of determining a position of a feature RT Huijgen, MJ Kea, MTM Van Kessel, M Ishibashi, CH Fan, HE Cekli, ... US Patent 10,578,980, 2020 | 5 | 2020 |
| Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product HE Cekli, M Ishibashi, LP Van Dijk, RJF Van Haren, XL Liu, RM Jungblut, ... US Patent 10,545,410, 2020 | 5 | 2020 |
| Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product HE Cekli, XL Liu, DM Slotboom, WT Tel, SCT Van Der Sanden, ... US Patent 10,025,193, 2018 | 5 | 2018 |
| Method to label substrates based on process parameters V Bastani, A Ypma, D Sonntag, EC Mos, HE Cekli, C Lin US Patent App. 16/960,376, 2020 | 4 | 2020 |
| Stirring anisotropic turbulence with an active grid HE Cekli, W van de Water Physics of Fluids 32 (7), 2020 | 4 | 2020 |
| Higher order feed-forward control of reticle writing error fingerprints R Van Haren, HE Cekli, J Beltman, A Pastol, F Sundermann, M Gatefait Photomask Technology 2015 9635, 29-39, 2015 | 4 | 2015 |
