Critical point lowering in thin PdHx films

R Feenstra, GJ de Bruin-Hordijk… - Journal of Physics F …, 1983 - iopscience.iop.org
R Feenstra, GJ de Bruin-Hordijk, HLM Bakker, R Griessen, DG de Groot
Journal of Physics F: Metal Physics, 1983iopscience.iop.org
Pressure-composition isotherms of PdH x films of 100-400 nm thickness have been
measured between 300 and 500K at pressures up to 10 bar by means of an oscillating
quartz microbalance. For all the films investigated the two-phase region is considerably
narrower than that of bulk PdH x. This narrowing of the miscibility gap, together with the
observed lowering of the critical temperature, is due to a weakening of the hydrogen-
hydrogen interaction which probably originates from the elastic boundary conditions at the …
Abstract
Pressure-composition isotherms of PdH x films of 100-400 nm thickness have been measured between 300 and 500K at pressures up to 10 bar by means of an oscillating quartz microbalance. For all the films investigated the two-phase region is considerably narrower than that of bulk PdH x. This narrowing of the miscibility gap, together with the observed lowering of the critical temperature, is due to a weakening of the hydrogen-hydrogen interaction which probably originates from the elastic boundary conditions at the film-substrate interface.
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